Ag-Modified FePtC Sputtering Target Density

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Solution Overview

Problem

High-concentration carbon in sputtering targets for FePtC-based magnetic recording films leads to low target density, increasing gas emission and compromising film properties, necessitating large-scale apparatuses for three-element simultaneous sputtering.

Innovation Solution

A sputtering target containing Fe, Pt, and Ag, with Ag content between 1 to 20% by mol, which increases target density and reduces gas emission, allowing for high-performance FePtC-based magnetic recording films without requiring large-scale apparatuses.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If carbon is contained in the sputtering target in a high concentration, then the magnetic properties of the FePtC-based thin film are improved, but the density of the sputtering target decreases

Engineering Contradiction:
Improvemagnetic propertiesVSAvoidtarget density
Core Design Contradiction:
ReliabilityVSManufacturing precision

Solution Approach 1:

Ag is introduced as an intermediary element that facilitates densification of the sputtering target during sintering. The Ag particles act as a mediator that enables Fe and Pt particles to pack more densely, achieving high target density even with high carbon content. This resolves the contradiction by using Ag as a temporary structural mediator that enables the desired density without requiring reduction of carbon concentration.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Quantity of substance

If the density of the sputtering target is low, then the amount of gas emitted from the sputtering target is increased, but the properties of the thin film formed by sputtering are lowered

Engineering Contradiction:
Improvegas emission amountVSAvoidthin film properties
Core Design Contradiction:
Quantity of substanceVSReliability

Solution Approach 1:

The invention changes the physical parameter of target density by incorporating Ag and optimizing sintering conditions. This parameter change reduces gas emission from the target during sputtering, thereby improving thin film properties. The density is increased from conventional low-density targets to ≥90% theoretical density, which suppresses gas emission and enhances film quality.

Inventive Principle:
Principle #35Parameter changes

3Reliability

If three-element simultaneous sputtering using three kinds of sputtering targets is carried out, then a FePtC-based magnetic recording film with excellent magnetic properties is obtained, but a large-scale apparatus with three or more cathodes becomes necessary

Engineering Contradiction:
Improvemagnetic propertiesVSAvoidapparatus scale
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The invention merges multiple separate sputtering targets (Fe, Pt, and C targets) into a single integrated FePtC sputtering target. This consolidation maintains the ability to produce FePtC-based magnetic recording films with excellent magnetic properties while eliminating the need for multiple cathodes and complex apparatus. The multi-element target combines all necessary elements in one component, simplifying the sputtering system.

Inventive Principle:
Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The inclusion of Ag in the sputtering target enhances density, reducing gas emission and improving thin film properties, enabling efficient production of high-performance magnetic recording films at lower temperatures and with fewer sputtering cathodes.

Implementation Method 1

When a mixed powder consisting of Fe powder, Pt powder, C powder and Ag powder is calcined, Ag accelerates dissolution of Fe and Pt in each other as solid solutions

Methodology Applied
Scientific EffectSolid solution formation: Solid Solution Strengthening

Implementation Method 2

a technique of sputtering Fe sputtering target, Pt sputtering target and C sputtering target at the same time to obtain a FePtC-based magnetic recording film

Methodology Applied
Scientific EffectSputtering: Sputtering

Data Source

PatentUS9011653B2Sputtering target
Publication Date: 2015.04.21 MITSUI MINING & SMELTING CO LTD
  • US9011653B2 patent drawing
  • US9011653B2 patent drawing
  • US9011653B2 patent drawing

AI summary

Provided is a sputtering target characterized by containing Ag and C. The sputtering target contains Ag in addition to Fe, Pt and C. By allowing the sputtering target to contain Ag, the sputtering target has high density. As a result, when the sputtering target is placed in a vacuum atmosphere in the sputtering process, the amount of a gas emitted from the sputtering target can be reduced, and the properties of a thin film formed by sputtering can be improved. Moreover, even when the sputtering target is produced by low-temperature sintering, it has high density.