Air Pad Mounting for Photomask Stress Uniformity

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

In the semiconductor industry, the use of gel layers as buffer layers in pellicle mounting systems for photomasks leads to non-uniform stress distribution, causing distortion and shifting errors during lithography operations, and makes it difficult to predict and address damage to the gel layer, resulting in higher costs and defective devices.

Innovation Solution

The use of an air pad with a compartment filled with air, supported by pins, which distributes stress uniformly across the photomask and allows for easy inspection and adjustment of air pressure without disassembly, reducing the risk of damage and improving the uniformity of stress application.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Strength

If a gel layer is used as a buffer layer in the mounting plate, then the photomask can be pressed against the pellicle supporting stage, but the stress distribution becomes non-uniform causing distortion and shifting errors

Engineering Contradiction:
Improvepressing force transmissionVSAvoidphotomask distortion
Core Design Contradiction:
StrengthVSManufacturing precision

Solution Approach 1:

The patent replaces the solid gel layer with an air-filled cushion (pneumatic buffer) that distributes stress uniformly across the photomask surface. The air cushion is contained within a mounting plate and allows for adjustable pressure to achieve uniform stress distribution without causing photomask distortion or shifting errors during pellicle mounting.

Inventive Principle:
Principle #29Pneumatics and hydraulics

2Ease of operation

If a gel layer is used as a buffer layer, then stress can be applied to mount the pellicle, but damage to the gel layer is difficult to predict and address

Engineering Contradiction:
Improvepellicle mountingVSAvoidgel layer durability
Core Design Contradiction:
Ease of operationVSReliability

Solution Approach 1:

The air cushion system allows operators to easily monitor and adjust the air pressure to ensure the mounting plate is properly inflated and functioning. This self-monitoring capability enables early detection of potential issues before they cause damage, and the system can be maintained by simply replacing or repressurizing the air cushion rather than dealing with degraded gel material.

Inventive Principle:
Principle #25Self-service

3Ease of manufacture

If a gel layer is used, then the mounting plate can function as intended, but inspection and maintenance require disassembly increasing complexity

Engineering Contradiction:
Improvemounting plate fabricationVSAvoidinspection procedure
Core Design Contradiction:
Ease of manufactureVSDevice complexity

Solution Approach 1:

The air cushion is designed as a removable or accessible component within the mounting plate, allowing operators to inspect, deflate, replace, or repressurize the air cushion without completely disassembling the mounting plate structure. This pneumatic design simplifies maintenance procedures compared to sealed gel layers that require full disassembly for inspection.

Inventive Principle:
Principle #29Pneumatics and hydraulics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution enhances the uniformity of stress distribution on the photomask, reduces the risk of damage to the buffer layer, and allows for regular inspection and maintenance, thereby minimizing the production of defective semiconductor devices due to photomask distortion.

Implementation Method 1

an air pad disposed between the first side and the second side, wherein the air pad comprises a compartment filled with air

Methodology Applied
Scientific EffectAir pressure: Pressure Increase

Data Source

PatentUS11294275B2Apparatus for mounting a pellicle to a photomask and method for mounting a pellicle to a photomask
Publication Date: 2022.04.05 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US11294275B2 patent drawing
  • US11294275B2 patent drawing
  • US11294275B2 patent drawing

AI summary

The present disclosure provides an apparatus for mounting a pellicle to a photomask, including a presser, a pellicle stage facing the presser, and a flexible material layer between the presser and the pellicle stage, wherein the flexible material layer includes a compartment filled with gas.