Alcohol-Based Resin Composition for Fine Pattern Shrinkage
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Solution Overview
Problem
Current microfabrication techniques face challenges in forming fine patterns smaller than 100 nm due to limitations in heat-dependent processes, inadequate pattern control, and low dry etching resistance, leading to inaccuracies and increased costs.
Innovation Solution
A resin composition containing a hydroxyl group, a crosslinking component, and an alcoholic solvent is used, which allows for precise pattern miniaturization through heat treatment and easy removal with an alkaline aqueous solution, enhancing etching resistance and reducing pattern defects.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If water-soluble resin is used for fine pattern formation, then pattern miniaturization is achieved, but dry etching resistance deteriorates
Solution Approach 1:
The patent changes the solvent parameter from water to alcohol, which fundamentally alters the resin's properties. The alcohol-soluble resin provides both fine pattern formation capability and improved dry etching resistance, resolving the contradiction between pattern miniaturization and etching resistance
Solution Approach 2:
The patent uses a composite system combining alcohol-soluble resin with specific additives including crosslinking agents and surfactants. This composite formulation achieves both fine pattern resolution and enhanced dry etching resistance that neither component could achieve alone
2Manufacturing precision
If heat treatment is applied for pattern shrinkage, then pattern miniaturization is achieved, but temperature control difficulty increases
Solution Approach 1:
The patent optimizes the heat treatment parameters by controlling temperature within a specific range (80-150°C) and time (30-180 seconds). This parameter control enables predictable pattern shrinkage while maintaining operational feasibility despite temperature control challenges
3Ease of manufacture
If existing coating facilities are used for resin application, then equipment cost is reduced, but coating quality for fine patterns deteriorates
Solution Approach 1:
The patent modifies coating parameters including thickness (30-200 nm), application method (spin coating, dip coating, or spray coating), and solvent composition to achieve fine pattern coverage using existing facilities. The alcohol-based solvent system enables better coating uniformity on fine patterns compared to water-based systems
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resin composition achieves accurate and economical miniaturization of resist patterns with low temperature dependency, excellent shape retention, and improved etching resistance, enabling the formation of precise trench patterns and holes on semiconductor substrates.
Implementation Method 1
a resin composition for forming fine patterns used for causing patterns formed by patterning to shrink by a heat treatment
Implementation Method 2
owing to increased wettability for photoresist patterns due to the use of an alcoholic solvent
Implementation Method 3
treating the positive-tone resist with heat to form a reaction layer on the boundary of the resist pattern and the positive resist layer
Data Source
AI summary
A resin composition which, in forming a fine pattern by a heat treatment of a resist pattern formed by using a photoresist, can be applied onto the resist pattern, can cause the resist pattern to smoothly shrink by heat treatment, and can be easily washed away by a treatment with an alkaline aqueous solution, and a method for efficiently forming a fine resist pattern using the resin composition are provided. The resin composition comprises a resin containing a hydroxyl group, a crosslinking component, and an alcohol solvent containing water in an amount of 10 wt % or less for the total solvent, wherein the alcohol in the alcohol solvent is a monovalent alcohol having 1 to 8 carbon atoms.