Atomic Layer Deposition Apparatus with Integrated Source Gas Module
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Solution Overview
Problem
The existing atomic layer deposition apparatuses become cumbersome and complex when multiple different thin layers need to be formed, as they require multiple modules, which increases size and complicates the process.
Innovation Solution
An atomic layer deposition apparatus with a single source gas supply module that includes multiple source gas nozzles and valves, allowing for the sequential and independent control of multiple source gases, which simplifies the process and reduces the apparatus's size by eliminating the need for separate modules for each source gas.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If multiple separate modules are used to supply different source gases, then each source gas can be independently controlled, but the apparatus size increases and the system becomes more complex
Solution Approach 1:
The patent combines multiple source gas supply modules into a single integrated source gas supply module. This single module contains multiple nozzles (first, second, and third source gas nozzles) that can independently supply different source gases (first, second, and third source gases) to the substrate, thereby reducing the number of separate modules while maintaining the capability to independently control multiple source gases.
Solution Approach 2:
The single source gas supply module is designed to perform multiple functions by incorporating different types of nozzles within it. The module can supply multiple different source gases through its multiple nozzles, making it a universal supply unit that replaces what would traditionally require multiple separate specialized modules.
2Adaptability or versatility
If multiple separate modules are used to supply different source gases, then each source gas can be independently controlled, but the apparatus size increases
Solution Approach 1:
The patent combines multiple source gas supply modules into a single integrated source gas supply module. This single module contains multiple nozzles (first, second, and third source gas nozzles) that can independently supply different source gases (first, second, and third source gases) to the substrate, thereby reducing the number of separate modules and reducing the overall apparatus size.
3Device complexity
If a single source gas supply module is used, then the apparatus size is reduced and the process is simplified, but control over multiple source gases must be achieved through sequential valve operation
Solution Approach 1:
The single source gas supply module is segmented into multiple independent nozzle units (first, second, and third source gas nozzles), each capable of independently supplying a different source gas. This segmentation allows each nozzle to be controlled independently through its own valve, enabling precise control over which source gas is supplied at any given time while maintaining a compact single-module structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables the formation of multiple thin layers on a substrate with improved efficiency and reduced apparatus size, simplifying the deposition process while maintaining control over the deposition of each source gas.
Implementation Method 1
In the adsorption step, a process chamber is provided with a precursor in a gaseous state, and the precursor is adsorbed on a surface of a substrate
Implementation Method 2
In the substitution step, the process chamber is provided with a reactant in a gaseous state, and a chemical substitution reaction may be performed between the reactant and the precursor adsorbed on the substrate
Implementation Method 3
The atomic layer deposition is a process in which an atomic layer is stacked layer-by-layer to form a fine thin layer
Data Source
AI summary
An atomic layer deposition apparatus includes a source gas supply part that supplies multiple source gases, a source gas supply module connected to the source gas supply part, a reaction gas supply part that supplies a reaction gas, a reaction gas supply module connected to the reaction gas supply part and spaced apart from the source gas supply module in a first direction, and a first purge gas supply module disposed between the source gas supply module and the reaction gas supply module.