Continuous Rotation ALD Carousel for High Aspect Ratio Deposition
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Solution Overview
Problem
Current atomic layer deposition processes are inefficient for processing substrates with aggressive geometries and high aspect ratios, as they require sequential introduction of reactant gases and purge steps, which can be slow and inefficient for continuous processing.
Innovation Solution
A deposition system with a rotatable wheel and multiple substrate carriers, combined with a gas distribution plate and robots for continuous loading and unloading of substrates without stopping the wheel, allowing for sequential processing and efficient gas distribution across substrates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If sequential introduction of reactant gases and purge steps is used in atomic layer deposition, then conformal deposition on substrates with complex geometries is achieved, but processing speed and efficiency deteriorate
Solution Approach 1:
The patent implements continuous rotation of the substrate carrier wheel throughout the entire deposition cycle, eliminating idle time between processing steps. Multiple substrates are continuously exposed to reactant gases in sequence while the wheel rotates, ensuring that useful deposition action occurs continuously without stopping or pausing the carrier rotation, thereby maintaining conformal deposition quality while significantly improving processing throughput
Solution Approach 2:
The patent pre-positions multiple substrates on the rotating carrier wheel at different angular positions before initiating the deposition sequence. This allows reactant gases to be introduced and distributed to multiple substrates in advance of their individual processing needs, enabling overlapping deposition cycles and eliminating waiting time between substrate processing steps
2Productivity
If multiple substrate carriers are used on a rotatable wheel for continuous processing, then processing efficiency and productivity are improved, but device complexity increases
Solution Approach 1:
The rotating carrier wheel serves multiple functions simultaneously: it acts as a substrate holder, a positioning mechanism, a distribution platform for gas exposure, and a timing synchronization device. The gas distribution plate also performs multiple roles by directing reactant gases to different angular positions on the wheel while simultaneously controlling the deposition sequence. This multi-functionality reduces the need for separate dedicated components for each function, thereby improving productivity without proportionally increasing overall system complexity
Solution Approach 2:
The patent combines the substrate transport mechanism, positioning system, and gas distribution timing into a single integrated rotating wheel assembly. Multiple substrates are mounted on the same carrier structure that rotates to bring them sequentially into the gas exposure zone, merging what would traditionally be separate transport and processing stations into one synchronized system, thus improving efficiency while controlling complexity through integration
3Loss of time
If continuous rotation of the substrate carrier wheel is implemented, then processing time is reduced and productivity increases, but precision of gas distribution and substrate positioning may deteriorate
Solution Approach 1:
The patent employs periodic introduction of reactant gases that is synchronized with the periodic rotation of the substrate carrier wheel. Reactant gases are introduced at specific intervals corresponding to the wheel's rotation period, ensuring that each substrate receives gas exposure at the precise moment it passes through the designated exposure zone. This periodic synchronization maintains positioning precision while enabling continuous rotation and reduced processing time
Solution Approach 2:
The system incorporates feedback control through sensors that monitor the angular position of substrates on the rotating wheel and the timing of gas distribution plate operation. This feedback ensures that reactant gases are introduced at the correct angular positions and that the wheel rotation speed and positioning are adjusted to maintain precise substrate alignment with gas flow, thereby preserving manufacturing precision during continuous high-speed operation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables rapid and efficient processing of substrates by allowing continuous substrate movement and gas exposure, improving conformal deposition on substrates with complex geometries and high aspect ratios.
Implementation Method 1
The gas distribution plate has a plurality of elongate gas ports configured to direct flows of gases toward the substrate carriers
Implementation Method 2
The loading station has a first robot for placing a substrate onto a substrate carrier while the wheel is rotating without stopping the wheel
Implementation Method 3
a second robot for removing a substrate from a substrate carrier while the wheel is rotating without stopping the wheel
Implementation Method 4
the rotatable wheel is configured to rotate the substrate carriers clockwise and counterclockwise
Data Source
AI summary
Provided are atomic layer deposition apparatus and methods including a rotating wheel with a plurality of substrate carriers for continuous processing of substrates. The processing chamber may have a loading station on the front end which is configured with one or more robots to load and unload substrates from the substrate carriers without needing to stop the rotating wheel.