ALD Vacuum Chamber Support Rails for Precise Reaction Chamber Positioning

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Solution Overview

Problem

The precise positioning of a movable reaction chamber within a vacuum chamber for atomic layer deposition becomes increasingly difficult and time-consuming as the size and weight of the reaction chamber increase, leading to prolonged downtime and challenges in making precursor and discharge connections.

Innovation Solution

The implementation of independently movable vacuum chamber support rails that allow for vertical adjustment and tilting of the reaction chamber, enabling precise positioning and secure gas couplings within the vacuum chamber, thereby facilitating efficient and automated gas supply and discharge operations.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Volume of moving object

If the size and weight of the reaction chamber are increased, then the processing capacity is improved, but the positioning precision and ease of connection deteriorate

Engineering Contradiction:

Improvereaction chamber volumeVSAvoidpositioning precision

Core Design Contradiction:

Volume of moving objectVSManufacturing precision

Solution Approach 1:

The patent introduces movable support rails as intermediary elements between the fixed vacuum chamber and the heavy reaction chamber. These rails act as mediators that bear the weight of the large reaction chamber and enable its precise positioning through controlled movement along the rail tracks, resolving the contradiction between handling large chambers and achieving precise positioning.

Inventive Principle:

Principle #24Intermediary (Mediator)

Solution Approach 2:

The patent replaces manual positioning mechanisms with automated movable support rails that can precisely position the reaction chamber. This substitution of mechanical systems with more advanced positioning mechanisms enables accurate placement of heavy, large-volume reaction chambers without the difficulties associated with manual handling.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

2Volume of moving object

If the size and weight of the reaction chamber are increased, then the processing capacity is improved, but the operation time increases

Engineering Contradiction:

Improvereaction chamber volumeVSAvoidpositioning time

Core Design Contradiction:

Volume of moving objectVSLoss of time

Solution Approach 1:

The movable support rails are pre-installed within the vacuum chamber, and the reaction chamber is designed with corresponding engagement features. This preliminary preparation enables quick engagement and positioning without time-consuming manual alignment procedures, thus reducing the time loss associated with handling large reaction chambers.

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The patent replaces slow, manual positioning operations with automated movable rail systems that can quickly and precisely position the reaction chamber. This mechanical substitution dramatically reduces the time required to handle large-volume reaction chambers.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

3Ease of operation

If the reaction chamber is made movable for efficient loading, then the ease of operation is improved, but the positioning difficulty increases

Engineering Contradiction:

Improveloading easeVSAvoidpositioning complexity

Core Design Contradiction:

Ease of operationVSDevice complexity

Solution Approach 1:

The patent segments the positioning function into two independent parts: the fixed vacuum chamber structure and the movable support rails. This segmentation allows the reaction chamber to be easily loaded and unloaded while the support rails handle the complex positioning task, thus maintaining ease of operation without increasing overall system complexity.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The movable support rails serve as intermediary elements that simplify the operation of loading and unloading the reaction chamber. By introducing this intermediate mechanism, the system achieves easy operation for chamber handling while the complexity of precise positioning is managed by the rail system itself.

Inventive Principle:

Principle #24Intermediary (Mediator)

Data Source

PatentUS12180587B2Vacuum chamber and arrangement for atomic layer deposition

Publication Date: 2024.12.31 BENEQ OY

AI summary

A vacuum chamber and an arrangement for atomic layer deposition. The vacuum chamber includes a loading wall provided with a loading opening, a back wall opposite the loading wall, and a first direction extending in a direction between the loading wall and the back wall. The vacuum chamber further includes a first vacuum chamber support rail inside the vacuum chamber and extending in the first direction, and a second vacuum chamber support rail inside the vacuum chamber and extending in the first direction and arranged spaced apart from the first vacuum chamber support rail. The first vacuum chamber support rail is arranged independently movable in vertical direction, and the second vacuum chamber support rail is arranged independently movable in vertical direction.