Integrated ALD Gas Distribution Unit for High Temperature Sealing
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Solution Overview
Problem
Existing gas distribution units for ALD reactors face challenges in providing symmetric and identical barrier grooves and seals, especially at high temperatures, leading to reduced operational time and increased cleaning requirements due to material limitations and diffusion issues.
Innovation Solution
A gas distribution unit with integrated barrier gas supply and discharge channels that eliminate the need for sealing surfaces between parts, using a solid body design with borings for gas channels and adjustable fittings for flow control, allowing for inert gas valving and temperature control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If multiple separate parts with sealing surfaces are used to create gas distribution unit, then gas flow control and barrier functions can be provided, but sealing members are required which have material limitations at high temperatures above 150°C
Solution Approach 1:
The patent combines multiple separate parts with sealing surfaces into a single integrated gas distribution unit body. The unit body contains all gas channels (precursor supply, purge gas, barrier gas) and discharge channels formed as internal cavities or passages within one piece, eliminating the need for multiple sealing interfaces and sealing members that cannot withstand high temperatures above 150°C.
Solution Approach 2:
The unit body is designed with distinct functional zones for different gas flows (precursor supply channels, purge gas channels, barrier gas channels, and discharge channels) that are separated internally within the single structure, allowing independent control of each gas flow without requiring external sealing between parts.
2Ease of operation
If precursor supply channels and discharge channels pass through the same sealing surfaces, then gas distribution is achieved, but mixing of precursor and discharge flows or diffusion along sealing surfaces occurs especially when sealing members are compromised
Solution Approach 1:
The patent integrates all gas channels and discharge channels within a single unit body structure, eliminating multiple sealing surfaces where flow mixing could occur. The internal cavity design ensures that precursor supply channels and discharge channels are spatially separated throughout their entire path without intersecting sealing interfaces.
Solution Approach 2:
The unit body acts as an intermediary structure that provides dedicated internal pathways for different gas flows. The barrier gas channel is positioned between the precursor supply and discharge channels, serving as a physical mediator that prevents mixing while allowing all channels to be formed within the same monolithic structure.
3Ease of manufacture
If sealing members are used in high temperature environment, then gas distribution unit can be assembled from separate parts, but cleaning requirements increase and operating time is shortened due to material deterioration
Solution Approach 1:
The patent manufactures the gas distribution unit as a single integrated body with all channels and pathways formed internally, eliminating the need for assembling multiple parts with sealing members. This monolithic construction removes the deterioration issue entirely, allowing continuous operation at high temperatures without cleaning or replacement of sealing components.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution simplifies the structure, reduces the number of parts and sealing surfaces, enables the use of elastomer seals at high temperatures, and enhances the operational efficiency by maintaining sharp gas pulses and preventing unwanted chemical vapor deposition.
Implementation Method 1
a principle called inert gas valving is used wherein by an appropriate feed and flow of inert gas the flow of reaction gas to in to reaction chamber and to the substrate is prevented
Implementation Method 2
a barrier gas outlet fitting connected to the process gas channel between the inlet surface and the barrier gas inlet fitting for discharging barrier gas from the process gas channel
Implementation Method 3
precursor supply channels and discharge channels passed through the same sealing or boundary surfaces causing mixing the precursor and discharge flows or diffusion of the precursor or discharge flow along the sealing surfaces
Data Source
AI summary
A gas distribution unit in connection with an atomic layer deposition reactor includes an inlet surface, an outlet surface, a process gas channel extending through the gas distribution unit and being open to the inlet surface and to the outlet surface, a barrier gas inlet fitting connected to the process gas channel between the inlet surface and the outlet surface for supplying barrier gas to the process gas channel, and a barrier gas outlet fitting connected to the process gas channel between the inlet surface and the barrier gas inlet fitting for discharging barrier gas from the process gas channel.