ALD Injector Gas Distribution Assembly
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Solution Overview
Problem
In carousel-type Atomic Layer Deposition (ALD) batch processing chambers, there is a need to increase plasma exposure time to enhance film formation, as existing processes often limit plasma exposure to the same duration as thermal exposure, which may not be sufficient for optimal film formation.
Innovation Solution
The implementation of a gas distribution assembly with alternating first and second injector units, including leading and trailing reactive gas ports surrounded by vacuum ports, and a merge vacuum port to create a mixed process region, allowing for increased plasma exposure by moving substrates through a gas curtain, thereby extending the time of plasma exposure relative to thermal exposure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If plasma exposure time is increased to enhance film formation, then film quality improves, but process complexity increases due to the need for separate plasma and thermal exposure segments
Solution Approach 1:
The gas distribution assembly is divided into multiple injector units, each with dedicated reactive gas ports and vacuum ports. This segmentation allows independent control of plasma and thermal exposure segments, enabling increased plasma exposure time while maintaining process organization and avoiding overwhelming complexity.
Solution Approach 2:
The system uses dynamic control of gas flow and vacuum timing to adjust plasma exposure duration independently from thermal exposure. By dynamically modulating the gas distribution assembly operations, the process can optimize film formation quality without requiring permanent structural changes that would increase complexity.
2Duration of action of moving object
If multiple reactive gas ports are used to enable longer plasma exposure, then plasma exposure time increases, but device structure becomes more complex
Solution Approach 1:
Multiple injector units with reactive gas ports and vacuum ports are merged into a single integrated gas distribution assembly. This consolidation allows the system to provide extended plasma exposure through coordinated operation of multiple ports while avoiding the complexity of separate, independent systems. The merge vacuum port encloses both leading and trailing reactive gas ports, creating a unified mixed process region.
Solution Approach 2:
The gas distribution assembly is designed as a multi-functional device that can deliver both plasma reactive gases and thermal reactive gases through its injector units. Each injector unit serves multiple purposes: delivering reactive gas, providing vacuum isolation, and enabling both plasma and thermal exposure modes. This universality reduces overall system complexity compared to having separate dedicated systems for each function.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach results in higher uniformity and effectiveness of film deposition, particularly for thin films, by preventing starting and ending pattern non-uniformity and minimizing material stripping, as the spatial ALD process allows for longer exposure to reactive gases without overlap, improving within-wafer uniformity performance.
Implementation Method 1
a first vacuum port surrounding the first reactive gas port, a second vacuum port surrounding the second reactive gas port, and a merge vacuum port forming a boundary enclosing a mixed process region
Data Source
AI summary
Apparatus and methods for processing a substrate including an injector unit, comprising a leading reactive gas port extending along a length of the injector unit, a trailing reactive gas port extending along the length of the injector unit, and a merge vacuum port forming a boundary around and enclosing the leading reactive gas port and the trailing reactive gas port.