Atomic Layer Deposition Device for Micro-Nano Particle Coating
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Solution Overview
Problem
Conventional atomic layer deposition techniques face challenges in uniformly and completely coating micro-nano particles due to their large specific surface area, leading to agglomeration and inefficient precursor utilization, making mass industrialized production difficult.
Innovation Solution
The redesign of the atomic layer deposition device with a cylindrical reaction chamber and a coaxially sleeved particle container, incorporating inner and outer gas circulation, a heating belt, and specific filter screens to enhance precursor contact and reaction efficiency, allowing for rapid temperature rise and improved coating uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional atomic layer deposition methods are used to coat micro-nano particles, then the coating process can be performed, but the coating uniformity and completeness deteriorate due to large specific surface area causing agglomeration
Solution Approach 1:
The particle container is designed to rotate during the deposition process, transforming the static particle arrangement into a dynamic state. This rotation prevents particles from settling and agglomerating in fixed positions, ensuring uniform exposure to precursor gases and achieving complete, uniform coating coverage across all particle surfaces.
Solution Approach 2:
A gas flow system is introduced to blow air through the particle container during deposition. This pneumatic action creates fluidization and circulation of particles, preventing agglomeration by keeping particles suspended and evenly distributed. The gas flow ensures continuous contact between precursor vapor and particle surfaces, improving coating completeness and uniformity.
2Quantity of substance
If conventional atomic layer deposition equipment is used for micro-nano particles, then the deposition can proceed, but precursor utilization efficiency deteriorates due to large specific surface area requiring large amounts of precursors
Solution Approach 1:
The particle container rotates continuously throughout the deposition process, ensuring that all particle surfaces are continuously exposed to the precursor vapor. This continuous action eliminates dead zones where precursor might be wasted, ensuring that every portion of the particle surface receives adequate coating material, thereby improving precursor utilization efficiency.
Solution Approach 2:
The system incorporates monitoring of deposition progress and precursor consumption patterns. By observing how precursors are consumed during the rotation and gas flow process, the system can optimize precursor delivery rates and timing, reducing waste and improving overall utilization efficiency while maintaining complete coverage.
3Productivity
If conventional atomic layer deposition methods are used, then the process can be performed, but reaction efficiency deteriorates due to insufficient precursor contact with particles
Solution Approach 1:
The rotation of the particle container creates dynamic movement of particles, ensuring that all surfaces are actively presented to the precursor vapor source. This dynamic exposure increases the effective contact area and duration between precursor and particles, enhancing reaction efficiency and achieving complete coating coverage.
Solution Approach 2:
The introduction of gas flow through the particle container creates pneumatic agitation and circulation. This gas flow actively transports precursor vapor to all particle surfaces and removes reaction byproducts, enhancing the reaction efficiency by maintaining optimal concentration gradients and preventing local saturation that would limit coating completeness.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design achieves more uniform and complete coating of micro-nano particles, increasing precursor utilization and enabling mass industrialized coating with improved reaction efficiency and shape retention.
Implementation Method 1
the heating belt heats the inner chamber of the reaction chamber
Implementation Method 2
the flange interface is connected to a vacuum pump for providing a desired vacuum environment for the inner chamber of the reaction chamber
Implementation Method 3
a filter screen is provided between the container upper cover and the container barrel, and a second filter screen is provided between the container barrel and the container lower cover, both the first and second filter screens enabling the passage of the precursor or carrier gas while blocking the passage of the micro-nano particles
Implementation Method 4
the riser is configured to generate up-and-down convection to drive the micro-nano particles to roll during the introduction of the precursor
Data Source
AI summary
An atomic layer deposition device for massively coating micro-nano particles, includes a reaction chamber and a particle container, in which an inlet port is provided at a lower end of the reaction chamber, and an inlet pipe for introducing a precursor or a carrier gas is provided in the inlet port; a chamber door is provided at an upper end of the reaction chamber, so that the particle container can be freely placed in or removed out of the reaction chamber; an air inlet hole is provided at a lower end of the particle container, and the inlet pipe enters the particle container through the air inlet hole.