ALD Nozzle Head Gas Distribution Chamber Design
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Solution Overview
Problem
Nozzle heads used in atomic layer deposition face challenges in maintaining precise control over gas supply connections at elevated temperatures, leading to thermal expansion and potential distortions, which complicates the movement and alignment during the spatial ALD process.
Innovation Solution
A nozzle head design with a simplified gas supply structure, featuring a nozzle head chamber that distributes precursor gases through branching conduits connecting a single external gas source to multiple nozzles, reducing the need for multiple seals and enhancing control during movement at elevated temperatures.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If separate supply channels are used for each nozzle, then gas distribution control is improved, but device complexity increases due to multiple connections and seals
Solution Approach 1:
Multiple separate supply channels are merged into a single supply channel that distributes gas to multiple nozzles. The patent describes a configuration where one supply channel serves multiple nozzles, reducing the number of connections and seals while maintaining precise gas distribution control through the shared channel architecture.
2Measurement precision
If multiple separate supply channels are used, then gas supply control to each nozzle is improved, but reliability decreases due to more seals and connections at elevated temperatures
Solution Approach 1:
The patent combines multiple supply channel connections into a single supply channel configuration, thereby reducing the total number of seals and connections. This merger maintains precise gas supply control to each nozzle while improving reliability by minimizing the number of potential failure points, especially critical in elevated temperature environments where seal performance degrades.
3Productivity
If nozzle head moves at elevated temperatures, then processing speed is improved, but manufacturing precision deteriorates due to thermal expansion and distortion
Solution Approach 1:
The nozzle head is designed with a segmented structure comprising a body portion and a separate nozzle array portion that can move relative to each other. This segmentation allows the nozzle array to accommodate thermal expansion and distortion independently while maintaining uniform gap distance from the substrate, thus preserving manufacturing precision during high-speed processing at elevated temperatures.
Solution Approach 2:
The patent implements a dynamic configuration where the nozzle array can move or adjust its position relative to the body portion in response to thermal conditions. This dynamic adjustment capability allows the system to compensate for thermal expansion and maintain precise gap uniformity during high-speed processing, resolving the contradiction between processing speed and manufacturing precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design simplifies the gas supply system, reducing the complexity of sealing multiple connections and maintaining precision during movement, even at high temperatures, thus improving the stability and efficiency of the ALD process.
Implementation Method 1
The nozzle head chamber is arranged in fluid communication with the two or more nozzles such that gas provided inside the nozzle head chamber can be supplied from the nozzle head chamber through gas passages between the two or more nozzles
Implementation Method 2
The process temperature may in same cases be even 300 °C or 350 °C or even more. These elevated process temperatures cause thermal expansion in the nozzle head and in the surrounding structures of the nozzle head in the whole process apparatus. The thermal expansion causes the dimensions of the nozzle head to change and it may also cause distortions to the shape and dimensions of the nozzle.
Data Source
Figure 1a~1c
Figure 2a~2c
Figure 3
AI summary
The invention relates to a nozzle head (2) for subjecting a surface of a substrate to successive surface reactions of at least two precursor gases according to the principles of atomic layer deposition. The nozzle head (2) comprises a body (4); an output face (16) via which at least one precursor gas is supplied towards the surface of the substrate; and two or more nozzles (6) provided in connection with the output face (16) for supplying the at least one precursor gas. The nozzle head (2) further comprises a nozzle head chamber (22) inside the body (4) of the nozzle head (2), said nozzle head chamber (22) is arranged in fluid communication with the two or more nozzles (6). The nozzle head chamber (22) is provided with a gas inlet (92) for supplying gas into the nozzle head chamber (22) from a gas source (94) outside the nozzle head (2).