Integrated Thermal Contact for ALD Precursor Source

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Solution Overview

Problem

Existing atomic layer deposition apparatuses face challenges in maintaining an increasing temperature gradient along the supply path of low vapor pressure precursor materials, leading to condensation issues that deteriorate the deposition process and apparatus performance.

Innovation Solution

A precursor source arrangement with a valve chamber and precursor source chamber, where the valve chamber heat transfer element is maintained at a higher temperature than the precursor source heat transfer element, ensuring an increasing temperature gradient through thermal energy transfer, and both chambers are designed to be gas-tight to minimize ventilation effects.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Temperature

If separate heating sheets are manually installed on precursor containers and supply lines to maintain temperature gradient, then temperature control is improved, but device complexity and ease of operation deteriorate

Engineering Contradiction:

Improvetemperature gradient along supply pathVSAvoidcomplexity of heating system

Core Design Contradiction:

TemperatureVSDevice complexity

Solution Approach 1:

The patent combines the heating functions for the precursor container and supply lines into a single integrated heating element. This heating element is in direct thermal contact with both the container and the supply line, eliminating the need for separate heating sheets and manual installation, thereby reducing device complexity while maintaining effective temperature control.

Inventive Principle:

Principle #5Merging (Combining)

Solution Approach 2:

The integrated heating element serves multiple functions simultaneously: it heats the precursor container, heats the supply line, and maintains the temperature gradient along the supply path. This multi-functionality reduces the number of components needed and simplifies the overall system.

Inventive Principle:

Principle #6Universality (Multi-functionality)

2Object-affected harmful factors

If precursor sources are ventilated to prevent condensation, then harmful factors are reduced, but maintaining temperature gradient becomes more difficult

Engineering Contradiction:

Improvecondensation of precursor materialVSAvoidtemperature gradient along supply path

Core Design Contradiction:

Object-affected harmful factorsVSTemperature

Solution Approach 1:

The patent creates a localized thermal environment around the precursor container and supply line by positioning the heating element in direct contact with these components. This localized heating maintains the temperature gradient in the critical areas where condensation would occur, while allowing ventilation in other areas of the system.

Inventive Principle:

Principle #3Local quality

Solution Approach 2:

The heating element is positioned to preemptively heat the precursor material and supply line before condensation can occur. By maintaining the temperature gradient in advance through direct thermal contact, the system prevents condensation formation rather than reacting to it after it occurs.

Inventive Principle:

Principle #9Preliminary anti-action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution effectively maintains a stable temperature gradient along the precursor supply path, reducing condensation and allowing for efficient precursor delivery while enabling ventilation of the surroundings without affecting the precursor material temperature.

Implementation Method 1

The valve chamber heat transfer element is arranged in heat transfer contact with the precursor source heat transfer element and arranged to transfer thermal energy from the valve chamber towards the precursor source chamber

Methodology Applied

Scientific EffectHeat transfer: Conduction (thermal)

Implementation Method 2

a precursor source chamber having a precursor container space inside the precursor source chamber for receiving the precursor container... and the precursor source chamber comprises a precursor source heat transfer element arranged to heat the precursor container inside the precursor container space

Methodology Applied

Scientific EffectHeating: Heating

Data Source

PatentUS12000043B2Precursor source arrangement and atomic layer deposition apparatus

Publication Date: 2024.06.04 BENEQ OY

AI summary

A precursor source arrangement for an atomic layer deposition reactor and to an atomic layer deposition apparatus wherein the precursor source arrangement includes a valve chamber having one or more supply valves, and a precursor source chamber having a precursor container space inside the precursor source chamber. The precursor source chamber includes a precursor source heat transfer element arranged to heat the precursor container inside the precursor container space. The valve chamber includes a valve chamber heat transfer element arranged to heat the one or more valves inside the valve chamber, and the valve chamber heat transfer element is arranged in heat transfer contact with the precursor source heat transfer element.