Top-Access ALD Reactor for Batch Substrate Loading
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Solution Overview
Problem
Current Atomic Layer Deposition (ALD) reactors face limitations in throughput and efficiency for mass production, particularly in loading and unloading processes, which hinder their transition from research and development to large-scale production.
Innovation Solution
A vertical flow ALD reactor system with a lid system and a loading robot that allows for top-accessible reaction chambers, enabling the simultaneous processing of multiple substrates through a lifting arrangement and motion mechanism for efficient loading and unloading sequences, reducing manual intervention and improving processing efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a single wafer or substrate is processed in an ALD reactor, then the processing quality and deposition precision are maintained, but the throughput and productivity are insufficient for mass production
Solution Approach 1:
The batch of substrates is divided into multiple substrate holders, with each holder carrying a subset of substrates. This segmentation allows the loading robot to efficiently manage and process multiple substrates in sequence while maintaining the controlled environment required for quality deposition.
Solution Approach 2:
The ALD reactor is designed to handle multiple substrate holders simultaneously, making it multi-functional for batch processing. The reactor chamber can accommodate various substrate holders with different configurations, enabling versatile processing capabilities while improving throughput.
2Loss of time
If manual loading and unloading operations are used, then the device complexity is low, but the loading and unloading time increases and cost-efficiency decreases
Solution Approach 1:
The loading robot autonomously performs the loading and unloading operations without requiring manual intervention. The robot picks up substrate holders from storage areas, transports them to the reactor, and performs the necessary operations, thereby reducing time loss and improving efficiency.
Solution Approach 2:
Manual mechanical operations are replaced with an automated robotic system. The loading robot uses mechanical arms and gripping mechanisms to handle substrate holders, replacing human hands and reducing the time and labor required for loading and unloading operations.
3Productivity
If multiple substrate holders are processed simultaneously in the reactor, then the throughput increases, but the coordination complexity and processing synchronization requirements increase
Solution Approach 1:
The control system monitors the status of multiple substrate holders within the reactor and adjusts processing parameters accordingly. Feedback mechanisms ensure that each substrate holder is processed at the correct stage, maintaining synchronization and preventing errors in the batch processing sequence.
Solution Approach 2:
Substrate holders are prepared and positioned in storage areas before being loaded into the reactor. The loading robot pre-arranges the sequence of substrate holders based on the processing requirements, ensuring that the coordination within the reactor is simplified and synchronization is maintained throughout the batch processing.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances throughput, reduces loading and unloading time, and increases cost-efficiency by enabling the processing of multiple substrates in a batch, thereby facilitating the transition to mass production.
Implementation Method 1
a lifting arrangement configured for lifting said lid system up for loading the reaction chamber
Implementation Method 2
a loading robot comprising a gripping part and a motion arrangement, the loading robot being configured to perform a loading sequence for loading the reaction chamber
Implementation Method 3
ALD utilizes chemisorption and eliminates physisorption during the deposition process. During chemisorption a strong chemical bond is formed between atom(s) of a solid phase surface and a molecule that is arriving from the gas phase
Implementation Method 4
Bonding by physisorption is much weaker because only van der Waals forces are involved. Physisorption bonds are easily broken by thermal energy when the local temperature is above the condensation temperature of the molecules
Implementation Method 5
ALD is a special chemical deposition method based on the sequential introduction of at least two reactive precursor species to a substrate that is located within a heated reaction space
Data Source
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AI summary
The invention relates to methods and apparatus in which a plurality of ALD reactors are placed in a pattern in relation to each other, each ALD reactor being configured to receive a batch of substrates for ALD processing, and each ALD reactor comprising a reaction chamber accessible from the top. A plurality of loading sequences is performed with a loading robot. Each loading sequence comprises picking up a substrate holder carrying a batch of substrates in a storage area or shelf,and moving said substrate holder with said batch of substrates into the reaction chamber of the ALD reactor in question.