ALD Outer Ring Alignment for Uniform Purge Passage Width
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Solution Overview
Problem
Existing atomic layer deposition (ALD) apparatuses suffer from non-uniform purge passage widths between the independent outer rings, leading to inconsistent purge gas flow and reduced exhaust efficiency, which can result in substrate contamination due to particle infiltration.
Innovation Solution
The apparatus incorporates a first outer ring with alignment grooves and a second outer ring with alignment pins to ensure a uniform width of the main purge passage and additional auxiliary purge passages, enhancing the flow of purge gas towards the stage's outskirts, thereby improving exhaust efficiency and preventing substrate contamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If the independent outer ring is not fixed, then the device complexity is reduced and ease of manufacture is improved, but the manufacturing precision of the purge passage width deteriorates
Solution Approach 1:
The patent introduces alignment pins as intermediary elements that fit into alignment grooves on the stage. These pins serve as mediators to establish a precise reference position for the outer ring, enabling the purge passage width to be uniformly controlled without requiring complex fixed mounting structures. The alignment pins translate the positioning function from a complex fixed connection to a simple insertable feature.
Solution Approach 2:
The patent replaces complex mechanical fixing mechanisms with a simpler alignment pin and groove system. Instead of using bolts, screws, or other complex mechanical fasteners to fix the outer ring position, the design uses precisely machined alignment pins that fit into grooves, achieving both ease of assembly and high positioning precision.
2Productivity
If the purge passage width is non-uniform, then the device complexity is reduced, but the exhaust efficiency of reaction gas deteriorates
Solution Approach 1:
The alignment pins act as intermediaries that enable the outer ring to be positioned with high precision relative to the stage. This precise positioning ensures uniform purge passage width, which in turn guarantees consistent exhaust efficiency across the entire substrate surface without requiring complex adjustable mechanisms.
Solution Approach 2:
The patent controls the geometric parameter of the purge passage width by using fixed alignment pins with specific dimensions. By changing from a variable width design to a fixed width design enforced by the alignment pins, the exhaust efficiency is improved while the device complexity is minimized.
3Reliability
If sufficient purge gas cannot flow through the narrow purge passage, then the device complexity is reduced, but the substrate purity deteriorates due to particle contamination
Solution Approach 1:
The alignment pins serve as intermediaries that establish a precise geometric relationship between the outer ring and stage, ensuring uniform purge passage width. This uniformity allows sufficient purge gas flow across the entire substrate area, preventing particle contamination while avoiding complex gas flow control mechanisms.
Solution Approach 2:
The patent segments the positioning function into discrete alignment pins that can be individually manufactured and assembled. This segmentation allows for precise control of the purge passage geometry without requiring complex integrated structures, ensuring adequate gas flow for substrate protection.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution ensures a uniform purge gas flow, enhancing the exhaust efficiency of reaction gases and effectively removing particles, thus preventing substrate contamination.
Implementation Method 1
The second outer ring may include at least one alignment pin configured to be inserted into the alignment groove
Implementation Method 2
The purge gas may flow through a purge passage between the outer ring and the independent outer ring
Data Source
AI summary
An apparatus for processing a substrate including a reaction chamber, a stage, a showerhead, a first outer ring and a second outer ring may be provided. The stage may be arranged in the reaction chamber to support the substrate. The showerhead may be arranged in the reaction chamber to provide the substrate with a reaction gas. The first outer ring may be configured to surround an edge portion of an upper surface of the stage. The first outer ring may include at least one alignment groove. The second outer ring may be configured to surround the first outer ring. The second outer ring may include at least one alignment pin configured to be inserted into the alignment groove. The first outer ring and the second outer ring may define a main purge passage having a uniform width therebetween to improve exhaust efficiency of the reaction gas.