Atomic Layer Deposition Showerhead Radial Gap Design
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Solution Overview
Problem
In atomic layer deposition systems, active ingredients in reaction gases easily deposit on the inner walls of the reaction chamber, leading to rapid accumulation of film residues, increased manufacturing costs, and reduced deposition quality.
Innovation Solution
The system includes a gas distribution showerhead assembly with gas diffusion plates and a first ring member, where the ring member is positioned to maintain a radial distance from the gas flow path, reducing contact and residue accumulation, and is made of low-reactivity materials like ceramic or metal oxide to minimize interference with the deposition process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If gas inlet channels directly supply reaction gas to the reaction chamber, then the deposition process is simple and efficient, but active ingredients deposit on the inner wall causing rapid accumulation of film residues
Solution Approach 1:
The patent introduces a gas distribution showerhead assembly as an intermediary component between the gas inlet channel and the reaction chamber. This assembly includes gas diffusion plates with through holes that distribute the reaction gas uniformly, preventing direct contact of high-concentration reactive gas with the chamber walls and thereby reducing film residue accumulation while maintaining deposition efficiency
Solution Approach 2:
The gas diffusion plate creates local quality variations in gas distribution by providing multiple through holes at different positions. This ensures that reaction gas is delivered preferentially to the substrate area rather than uniformly across the entire chamber, concentrating the reactive ingredients where needed and minimizing wall deposition
2Manufacturing precision
If the reaction chamber is cleaned regularly to remove film residues, then deposition quality is maintained, but manufacturing cost increases and manufacturing efficiency decreases
Solution Approach 1:
The patent converts the harmful effect of reactive gas by using it to perform useful work on the substrate while preventing its harmful deposition on walls. The gas distribution showerhead assembly achieves this by directing and controlling the gas flow, transforming the potentially harmful reactive ingredients into beneficial deposition material on the substrate while minimizing wall accumulation, thereby reducing cleaning frequency and maintaining productivity
3Object-generated harmful factors
If gas diffusion plates are introduced to distribute gas uniformly, then residue accumulation is reduced, but device complexity increases
Solution Approach 1:
The gas distribution showerhead assembly is segmented into multiple functional components: gas inlet channels, gas diffusion plates with through holes, and support structures. This segmentation allows each component to perform its specific function efficiently while maintaining overall system manageability and ease of fabrication, reducing the complexity burden despite the added functionality
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design effectively prevents residue buildup on the reaction chamber walls, enhancing deposition quality and reducing maintenance costs by ensuring uniform gas distribution and minimizing substrate deposition interference.
Implementation Method 1
at least one gas diffusion plate located between the platform and the at least one gas inlet channel... Each of the at least one gas diffusion plate includes a plurality of through holes disposed therethrough
Data Source
AI summary
An atomic layer deposition system is provided, including: a main body, a platform, a gas distribution showerhead assembly and a first ring member. The main body defines a reaction chamber, and the platform is located in the reaction chamber. The gas distribution showerhead assembly is disposed on the main body and includes at least one gas inlet channel and at least one gas diffusion plate. Each of the at least one gas diffusion plate includes a plurality of through holes. The first ring member defines a radial direction and is disposed between the platform and the at least one gas diffusion plate. A region of the at least one gas diffusion plate distributed with the plurality of through holes defines an outermost distribution profile. An inner circumferential wall of the first ring member and the outermost distribution profile keep a distance in the radial direction.