ALD Valve Timing Compensation for Consistent Film Deposition
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Solution Overview
Problem
In semiconductor substrate processing, the quality of deposited films is compromised due to delays in valve response times, leading to inconsistent precursor delivery and suboptimal reaction timing during atomic layer deposition (ALD) processes.
Innovation Solution
A semiconductor substrate processing apparatus with a valve monitor system that senses valve opening and closing times, calculates time delays, and adjusts valve activation signals to account for standard and delayed reaction times, ensuring precise timing by generating correction times for delayed reaction valves and updating the process recipe accordingly.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If high speed valves are used to provide precursor flows cyclically, then the deposition speed is improved, but the valve response time delay causes inconsistent precursor delivery and compromises film quality
Solution Approach 1:
The system performs preliminary action by measuring the actual valve response time before the ALD process and pre-calculating correction values. The controller stores these correction values and applies them during processing to compensate for valve response delays, ensuring precise precursor delivery timing despite the inherent delay in high-speed valve operation.
Solution Approach 2:
The system implements feedback by continuously monitoring valve response times and using this information to adjust activation signals. The controller measures the actual time between valve activation signal and precursor flow detection, then uses this feedback to optimize subsequent valve timing, maintaining consistent film quality while preserving high deposition speed.
2Ease of operation
If valve activation signals are generated according to a predetermined recipe, then the process follows a standard schedule, but valve response time delays cause timing inconsistencies that affect reaction precision
Solution Approach 1:
The system changes the timing parameter of valve activation signals dynamically based on measured valve response characteristics. Instead of using fixed timing from the recipe, the controller adjusts the valve activation timing by adding correction values that compensate for each valve's specific response delay, thereby maintaining precise reaction timing while preserving ease of operation through automated adjustment.
3Device complexity
If the valve response time is not compensated, then the system operation is simple, but the inconsistent valve timing leads to suboptimal reaction conditions and reduced process reliability
Solution Approach 1:
The system implements self-service by automatically measuring its own valve response times and generating appropriate correction values without external intervention. The controller autonomously optimizes valve timing parameters based on actual system performance, maintaining simple operation while significantly improving process reliability through continuous self-calibration.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution ensures consistent and precise valve operation, improving the quality of deposited films by synchronizing valve responses, thereby enhancing the overall efficiency and reliability of semiconductor substrate processing.
Implementation Method 1
a sensor operationally coupled to the valve to sense the opening and closing of the valve and the sensor generates a valve movement signal when movement of the valve is sensed... the sensor is an optical sensor
Data Source
AI summary
Apparatus and method for semiconductor substrate processing are presented. For devices such as valves used for semiconductor substrate processing especially a process like ALD, there is a need to monitor and control the exact time taken from the signal to open and close the valves so that delay times may be controlled. In an embodiment, an apparatus comprising a reactor, a valve, a process controller and a valve monitor system is presented. The process controller may be operationally connected to the valve and may be provided with a memory. The sensors may be either electrical or optical sensors.