Photon-Enhanced ALD Window Contamination Prevention
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Solution Overview
Problem
In photon-enhanced atomic layer deposition (ALD) reactors, the use of a light source can cause window contamination, leading to operational challenges.
Innovation Solution
A substrate processing apparatus is designed with a reaction chamber, a photon source providing photons from the top, a chemical inlet, and a chemical outlet that separates the reaction chamber from a surrounding space, along with a window that allows photons to pass through while being purged to prevent contamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Illumination intensity
If a window is used to allow photons to pass from the photon source to the reaction chamber, then the photon transmission function is achieved, but the window becomes contaminated by reactive chemicals and deposition materials
Solution Approach 1:
The patent removes the window component from the system by providing photons from the top side of the reaction chamber through the chemical outlet structure itself, eliminating the source of window contamination while maintaining photon transmission functionality
Solution Approach 2:
The chemical outlet structure serves as an intermediary that both provides structural separation and allows photon transmission without requiring a separate window component, thus preventing contamination while enabling light passage
2Illumination intensity
If a window is installed in the reaction chamber to allow photon entry, then photons can reach the substrate, but the window requires additional protective measures and purging systems
Solution Approach 1:
The window is completely removed from the system architecture. Instead of installing a window and adding protective measures, the patent delivers photons directly through the top of the reaction chamber via the chemical outlet, eliminating the need for protective systems
Solution Approach 2:
The chemical outlet structure performs multiple functions: it provides structural separation, enables photon transmission, and eliminates the need for separate protective measures, simplifying the overall system design
3Reliability
If the reaction chamber is separated from the surrounding space by a chemical outlet structure, then the reaction environment is controlled, but the photon source access is limited
Solution Approach 1:
The patent changes the spatial arrangement by providing photons from the top side (vertical dimension) through the chemical outlet, rather than attempting lateral access, thus maintaining separation while enabling photon delivery
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively prevents window contamination by purging the reaction chamber side of the window and using a filtered photon spectrum to enhance ALD reactions, maintaining the integrity of the deposition process.
Implementation Method 1
a window that allows photons to pass through
Implementation Method 2
purge the reaction chamber side of the window
Implementation Method 3
photon-enhanced atomic layer deposition (ALD) reactors
Data Source
AI summary
A substrate processing apparatus, including a reaction chamber to process a substrate, a photon source to provide the reaction chamber with photons from the top side of the reaction chamber, a substrate support to support the substrate, a chemical inlet to provide the reaction chamber with a reactive chemical; and a chemical outlet to exhaust gases from the reaction chamber, the chemical outlet including a surface separating the reaction chamber from a surrounding space.