Alicyclic Olefin Resin Composition for High-Sensitivity Electronics

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Solution Overview

Problem

Current radiation-sensitive resin compositions for electronic devices lack high exposure sensitivity, transparency after baking in oxidizing atmospheres, and low corrosiveness to metals, particularly in high-density interconnect applications.

Innovation Solution

A radiation-sensitive resin composition comprising an alicyclic olefin polymer with an acidic group, a sulfonium salt-based photoacid generator, and a cross-linking agent, specifically designed to enhance exposure sensitivity, transparency, and metal corrosiveness resistance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If epoxy resins and heat curable resin materials are used for radiation-sensitive resin compositions, then the resin films can provide basic insulating ability and flattening properties, but the exposure sensitivity is insufficient and transparency after baking in oxidizing atmosphere deteriorates

Engineering Contradiction:
Improveexposure sensitivityVSAvoidtransparency after baking
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

The patent changes the chemical composition parameters of the resin system by using alicyclic olefin polymer with acidic groups instead of conventional epoxy resins, and selecting specific crosslinking agents that maintain transparency after baking in oxidizing atmospheres

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent creates a composite resin composition by combining alicyclic olefin polymer with acidic groups, specific crosslinking agents, and other additives to achieve both high exposure sensitivity and maintained transparency after baking

Inventive Principle:
Principle #40Composite materials

2Reliability

If conventional radiation-sensitive resin compositions are used to form resin films for high-density interconnects, then basic insulating properties are achieved, but low corrosiveness to metal materials is insufficient

Engineering Contradiction:
Improvelow corrosiveness to metalVSAvoidresin composition formulation
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent changes the chemical parameters of the resin composition by incorporating alicyclic olefin polymer with acidic groups that inherently provide low corrosiveness to metal materials, eliminating the need for complex additional corrosion-inhibiting additives

Inventive Principle:
Principle #35Parameter changes

3Duration of action of stationary object

If resin materials with high insulating ability are selected for organic EL devices, then device lifetime is extended, but gas generation characteristics during baking deteriorate

Engineering Contradiction:
Improvedevice lifetimeVSAvoidgas generation characteristic
Core Design Contradiction:
Duration of action of stationary objectVSObject-generated harmful factors

Solution Approach 1:

The patent changes the thermal stability parameters of the resin composition by using alicyclic olefin polymer and specific crosslinking agents that resist decomposition and gas generation during baking processes, thereby extending device lifetime without harmful gas evolution

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The composition achieves high exposure sensitivity, maintains transparency after baking in oxidizing conditions, and exhibits excellent low corrosiveness to metals, improving the performance and reliability of electronic devices with resin films.

Implementation Method 1

sulfonium salt-based photoacid generator (B) which is represented by the following general formula (1)

Methodology Applied
Scientific EffectPhotodissociation: Photodissociation

Data Source

PatentUS9798233B2Radiation-sensitive resin composition and electronic device
Publication Date: 2017.10.24 ZEON CORP
  • US9798233B2 patent drawing
  • US9798233B2 patent drawing
  • US9798233B2 patent drawing

AI summary

A radiation-sensitive resin composition containing an alicyclic olefin polymer which has an acidic group (A), a sulfonium salt-based photoacid generator (B) which is represented by the following general formula (1), and a cross-linking agent (C) is provided.(In the above general formula (1), R1, R2, and R3 respectively independently are a C6 to C30 aryl group, C4 to C30 heterocyclic group, C1 to C30 alkyl group, C2 to C30 alkenyl group, or C2 to C30 alkynyl group, the groups being optionally substituted, and “a” is an integer of 1 to 5.)