Alignment Mark Structure for Mask Misalignment Correction

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Solution Overview

Problem

In the manufacturing of large flat panel displays, accurately measuring and correcting misalignment of masks during the sequential alignment process is challenging due to the limited size of pattern masks, which can lead to failures in layer formation and structural defects.

Innovation Solution

A display device with alignment marks that include a quadrangular-shaped center portion and surrounding measurement portions, allowing for the accurate measurement of mask misalignment by comparing distances between these features, which are formed simultaneously with the patterning process using multiple masks.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Volume of moving object

If sequential mask alignment is used for large display devices, then the display device can be manufactured with larger size, but mask misalignment occurs leading to manufacturing precision degradation

Engineering Contradiction:
Improvedisplay device sizeVSAvoidmask alignment precision
Core Design Contradiction:
Volume of moving objectVSManufacturing precision

Solution Approach 1:

Alignment marks are formed in advance on the substrate before the actual patterning process. These pre-formed marks serve as reference points that enable precise measurement and correction of mask alignment during sequential exposure, thus maintaining manufacturing precision while allowing larger display device sizes

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The alignment marks act as an intermediary element between the mask and the substrate. By providing measurable reference features, they mediate the alignment process and enable detection of positional deviations, allowing for correction of mask misalignment without compromising the final patterning precision

Inventive Principle:
Principle #24Intermediary (Mediator)

2Adaptability or versatility

If multiple masks are used for patterning, then complex patterns can be formed, but alignment measurement becomes difficult leading to detection difficulty

Engineering Contradiction:
Improvepatterning capabilityVSAvoidalignment measurement difficulty
Core Design Contradiction:
Adaptability or versatilityVSDifficulty of detecting and measuring

Solution Approach 1:

Alignment marks serve as intermediary reference features that simplify the measurement process. Instead of directly measuring complex pattern alignments, the system uses these simple, well-defined marks as intermediaries to detect mask positions and calculate alignment errors, making detection straightforward even when multiple masks are involved

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The alignment marks utilize contrasting materials (such as light-blocking and light-transmitting regions) that create distinct visual or optical signals. This contrast enables easy detection and measurement of mark positions, facilitating accurate alignment measurement despite the complexity of multiple mask patterning steps

Inventive Principle:
Principle #32Color changes

Data Source

PatentUS11392047B2Display device and manufacturing method thereof
Publication Date: 2022.07.19 SAMSUNG DISPLAY CO LTD
  • US11392047B2 patent drawing
  • US11392047B2 patent drawing
  • US11392047B2 patent drawing

AI summary

A method of manufacturing a display device including: preparing a substrate having a display area and a non-display area; and forming an alignment mark disposed in the non-display area of the substrate. The alignment mark includes a quadrangular-shaped center portion and a plurality of measurement portions that surround the center portion, the plurality of measurement portions including four or more measurement portions, and each of the measurement portions including sides that are parallel with two sides of the quadrangular-shaped center portion.