Aliphatic Polycyclic Underlayer for Vertical Self-Assembly

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Solution Overview

Problem

Existing methods for forming self-assembled films using block polymers struggle to align vertical patterns without intermixing with the upper layer, limiting their application in technologies like liquid crystal displays and nanoimprint templates.

Innovation Solution

A composition for forming an underlayer film containing polymers with aliphatic polycyclic structures and aromatic ring structures, which induces microphase separation and allows for the formation of vertical patterns in self-assembled films without intermixing, using a process involving thermal baking and specific polymer chains.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a block polymer is used to form a self-assembled film, then a nano-scale repeating structure can be achieved, but vertical pattern alignment without intermixing with the upper layer is difficult

Engineering Contradiction:

Improvevertical pattern alignmentVSAvoidlayer intermixing

Core Design Contradiction:

Manufacturing precisionVSStability of the object's composition

Solution Approach 1:

The underlayer film is designed with specific local properties: it uses a polymer containing aliphatic polycyclic structures (such as norbornene or dicyclopentadiene units) that provide controlled surface energy and microphase separation characteristics. This local quality modification at the underlayer interface enables vertical pattern formation while preventing intermixing with the block polymer upper layer.

Inventive Principle:

Principle #3Local quality

Solution Approach 2:

The invention changes the chemical composition parameters of the underlayer film by incorporating polymers with aliphatic polycyclic structures. This parameter change modifies the surface energy and thermal properties of the underlayer, creating optimal conditions for vertical self-assembly of the block polymer while maintaining layer stability and preventing intermixing.

Inventive Principle:

Principle #35Parameter changes

2Stability of the object's composition

If the underlayer film composition is modified to prevent intermixing, then layer stability improves, but the ability to align vertical patterns may be compromised

Engineering Contradiction:

Improvelayer stabilityVSAvoidpattern alignment

Core Design Contradiction:

Stability of the object's compositionVSManufacturing precision

Solution Approach 1:

The underlayer film uses a composite polymer system containing aliphatic polycyclic structures combined with other functional groups. This composite material approach allows simultaneous optimization of layer stability (through controlled composition) and vertical pattern alignment (through tailored surface energy and microphase separation characteristics).

Inventive Principle:

Principle #40Composite materials

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution enables the formation of self-assembled films with vertical lamellar or cylinder structures, facilitating the creation of precise patterns for various applications by exploiting differences in etching rates and surface energies between polymer chains.

Implementation Method 1

induces microphase separation and allows for the formation of vertical patterns in self-assembled films

Methodology Applied

Scientific EffectMicrophase separation:

Implementation Method 2

a composition for forming an underlayer film of a thermosetting self-assembled film to be formed by thermal baking

Methodology Applied

Scientific EffectThermal baking: Heating

Implementation Method 3

changing the irregularities and (hydrophilic or hydrophobic) surface energy of surface of the underlayer film

Methodology Applied

Scientific EffectSurface energy difference: Surface Tension

Data Source

PatentUS11674053B2Composition for forming underlayer film of self-assembled film including aliphatic polycyclic structure

Publication Date: 2023.06.13 NISSAN CHEM CORP

AI summary

A composition for forming an underlayer film necessary for facilitating alignment of self-assembled film into desired vertical pattern. Composition for forming an underlayer film of self-assembled film including a polymer having unit structure containing aliphatic polycyclic structure of aliphatic polycyclic compound in main chain. The polymer is a polymer having unit structure containing aliphatic polycyclic structure of aliphatic polycyclic compound with aromatic ring structure of aromatic ring-containing compound or polymer chain derived from vinyl group of vinyl group-containing compound in main chain. The polymer has unit structure of Formula (1):X—Y Formula (1)wherein X is single bond, divalent group having vinyl structure as polymer chain, or divalent group having aromatic ring-containing structure as polymer chain, and Y is divalent group having aliphatic polycyclic structure as polymer chain. The aliphatic polycyclic compound is bi- to hexa-cyclic diene compound. The aliphatic polycyclic compound is dicyclopentadiene or norbornadiene.