Amino-Modified Sequencing Chip for Uniform Nucleic Acid Loading
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Solution Overview
Problem
Existing nucleic acid detection technologies require specific chips tailored for each sequencing platform, lacking uniformity and consistency in surface properties, which affects the performance and applicability of sequencing technologies.
Innovation Solution
A chip with a uniformly modified surface, featuring a high biochemical activity, allows controlled loading of oligonucleotide sequences and nucleic acid molecules, suitable for single-molecule and high-throughput sequencing platforms, and can be prepared in batches with stable and consistent properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional sputtering methods are used to prepare transparent conductive oxide films, then the films can be deposited, but the films exhibit poor uniformity, high resistance, and easy delamination
Solution Approach 1:
The sputtering process is divided into multiple stages with different gas flow ratios. The first stage uses a specific gas flow ratio to deposit the initial film layer, while the second stage uses a different gas flow ratio to complete the deposition. This segmented approach allows optimization of each stage for specific purposes, improving overall film quality, uniformity, and adhesion.
Solution Approach 2:
A buffer layer is deposited before the transparent conductive oxide film to prepare the substrate surface. This preliminary action creates a favorable interface that improves adhesion and prevents delamination of the subsequent film layers.
2Manufacturing precision
If conventional sputtering methods are used, then the process can be completed in standard conditions, but the films exhibit high resistance and poor uniformity
Solution Approach 1:
The gas flow ratio is dynamically adjusted during the sputtering process. By changing the gas flow ratio between the first and second stages, the deposition conditions are optimized to achieve better film uniformity and lower resistance. This dynamic adjustment allows the process to adapt to different deposition requirements.
Solution Approach 2:
The gas flow ratio parameter is changed between different stages of the sputtering process. The first stage uses one gas flow ratio to initiate film formation, while the second stage uses a different gas flow ratio to optimize film properties. This parameter change enables control over film uniformity and resistance.
3Area of stationary object
If transparent conductive oxide films are applied to large-area displays, then display coverage is improved, but film quality deteriorates due to sputtering limitations
Solution Approach 1:
The sputtering process is segmented into multiple stages with different gas flow ratios, allowing each stage to be optimized for large-area deposition. This ensures consistent film quality across the entire display area, preventing the uniformity deterioration that typically occurs with large-area sputtering.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The chip ensures consistent performance across different sequencing platforms, facilitating easy and reproducible preparation, enhancing industrial applicability and suitability for platforms like ILLUMINA and BGI, with controlled density and amount of nucleic acid molecules for accurate detection.
Implementation Method 1
the film is prepared by sputtering
Data Source
Figure 1~3
Figure 4~6
AI summary
The present application relates to a chip, a preparation method therefor, and an application thereof. The chip of embodiments of the present application comprises: a substrate having a surface grafted with an amino group, the amino group being a primary amino group or a secondary amino group; and a first compound linked to the surface via the amino group, the first compound comprising the following structure,i.e., formula (1) or formula (2), wherein R1 and R2 are each independently selected from -OH or C1-C5 alkoxy, and n is 1 or 2. The chip can be used for a nucleic acid test, such as single-molecule sequencing and next-generation sequencing.