Amorphous Coated Substrate with Electrochemical Thickness Control
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional coated substrates are not suitable for various applications and mass production, particularly in complex shapes, due to limitations in thickness control and film formation methods.
Innovation Solution
A coated substrate with a film thickness of 1 nm to less than 800 nm, containing 0.1 atm% to 20 atm% carbon, 70 atm% or more total metal and oxygen, a relative density of 90% or greater, and an amorphous structure, formed using a dry film-formation method with a bath liquid containing organic solvents and controlled voltage application.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a wet film-formation method is employed, then film formation is simple, but thickness control is difficult on complex substrate shapes
Solution Approach 1:
The patent replaces the wet film-formation method (chemical/physical deposition) with a dry process involving electrochemical reactions. Metal ions in the bath liquid are reduced to metal atoms on the substrate surface through electrochemical reduction, enabling precise thickness control via voltage and time parameters while maintaining simplicity in the process
Solution Approach 2:
The patent controls film thickness by precisely adjusting electrochemical parameters (voltage, time, metal ion concentration) rather than relying on wet film deposition parameters. By changing these electrical and chemical parameters, the film thickness can be accurately controlled on complex substrate shapes
2Productivity
If conventional coated substrates are used, then production is limited, but application versatility is insufficient
Solution Approach 1:
The patent creates a universal coating system that can apply to various substrate types and applications through electrochemical deposition. The bath liquid can be formulated with different metal ions to produce various film compositions (metallic, oxide, carbide) suitable for different applications including corrosion protection, catalysis, and electronic applications
Solution Approach 2:
The patent achieves versatility by adjusting the composition of the bath liquid (metal ion types, organic solvent types, additives) and electrochemical parameters. This allows the same basic process to produce different film compositions and properties for various applications, enabling mass production across multiple product lines
3Reliability
If film thickness is increased for better protection, then coating performance improves, but material cost and production time increase
Solution Approach 1:
The electrochemical deposition process allows continuous and uniform metal ion reduction across the entire substrate surface. By maintaining controlled current density and bath composition, the process achieves uniform film formation without material waste, and film thickness can be precisely controlled to achieve required protection with minimal material consumption
Solution Approach 2:
The patent controls material consumption by adjusting electrochemical parameters (current density, time, metal ion concentration) to achieve the required film thickness efficiently. By optimizing these parameters, the process minimizes metal ion consumption while ensuring adequate film thickness for protection
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables a novel coated substrate that can be applied to various fields and produced in large quantities, with enhanced adhesion and functional properties, while reducing the need for expensive materials and post-treatments.
Implementation Method 1
a dry film-formation method (dry process) has been employed so as to perform thickness control in accordance with complex substrate shapes
Implementation Method 2
x-ray photoelectron spectroscopic measurement of the film shows that the percent element composition of C (carbon) is 0.1 atm % or greater and less than 20 atm %
Data Source
AI summary
A novel coated substrate which can be applied to various fields and can be mass-produced is provided. A coated substrate has a substrate coated with a film. The thickness of the film is 1 nm or greater and less than 800 nm. X-ray photoelectron spectroscopic measurement of the film shows that the percent element composition of C (carbon) is 0.1 atm % or greater and less than 20 atm %, and the total percent element composition of a metal element and O (oxygen) is 70 atm % or greater. The relative density of the film is 90% or greater. The film is amorphous.