Amorphous Semiconductor Optical Modulator with Single Crystal Silicon Contacts

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Solution Overview

Problem

The use of amorphous semiconductors in optical modulators results in high element resistance and increased power consumption due to low carrier mobility, which is not effectively addressed by existing technologies.

Innovation Solution

An optical modulator design featuring a core made of amorphous semiconductor material with p-type and n-type layers formed from single crystal silicon, which reduces element resistance and the amount of current injected by utilizing low resistance paths for carrier injection.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Loss of energy

If an amorphous semiconductor is used for the core to reduce free carrier absorption, then light modulation efficiency is improved, but element resistance increases and power consumption increases

Engineering Contradiction:
Improvefree carrier absorption lossVSAvoidpower consumption
Core Design Contradiction:
Loss of energyVSUse of energy by stationary object

Solution Approach 1:

The patent applies different material qualities to different regions: the core uses amorphous semiconductor for low absorption, while the contact regions use single crystal silicon for low resistance. This local differentiation resolves the contradiction between reducing absorption loss and maintaining low power consumption.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent creates a composite structure combining amorphous semiconductor (core) with single crystal silicon (contact layers). This composite approach allows the system to simultaneously achieve the advantages of both materials: low absorption in the core and low resistance at contacts.

Inventive Principle:
Principle #40Composite materials

2Reliability

If an amorphous semiconductor is used for the core to improve light modulation, then optical performance is improved, but element resistance increases

Engineering Contradiction:
Improvelight modulation performanceVSAvoidelement resistance
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The patent differentiates material properties by location: amorphous semiconductor in the optical core for modulation performance, single crystal silicon at contacts for electrical performance. This resolves the contradiction between optical reliability and electrical resistance.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The single crystal silicon contact layers act as intermediary elements between the amorphous semiconductor core and the electrodes, providing a low-resistance electrical path without compromising the optical properties of the core.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration effectively curbs the increase in element resistance and reduces the amount of current injected, thereby lowering power consumption while maintaining light modulation capabilities.

Implementation Method 1

the intensity and phase of light are modulated using a carrier plasma effect in silicon optical modulators

Methodology Applied
Scientific EffectFree carrier absorption: Absorption (EM radiation)

Implementation Method 2

the intensity and phase of light are modulated using a carrier plasma effect in silicon optical modulators

Methodology Applied
Scientific EffectCarrier plasma effect: Plasma

Data Source

PatentUS11977282B2Optical modulator
Publication Date: 2024.05.07 NIPPON TELEGRAPH & TELEPHONE CORP
  • US11977282B2 patent drawing
  • US11977282B2 patent drawing
  • US11977282B2 patent drawing

AI summary

A core, constituted by an amorphous undoped semiconductor (i type), which is formed on a lower clad layer, and a p-type layer and an n-type layer which are disposed on the lower clad layer with the core interposed therebetween and are formed in contact with the core are provided. The core is formed to be thicker than the p-type layer and the n-type layer. The p-type layer and the n-type layer are constituted by single crystal silicon.