Amorphous Silicon Photo Diode for Enhanced Light Sensitivity

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Solution Overview

Problem

Conventional light emitting display devices with photo diodes (PDs) formed of polycrystalline silicon have low light sensitivity, leading to inefficient luminance control of LEDs due to insufficient electrical signal generation.

Innovation Solution

A light emitting display device with a photo diode featuring an intrinsic region made of amorphous silicon, doped with argon, hydrogen, nitrogen, or silane, which enhances light receiving efficiency by increasing the sensitivity to ambient light, allowing for improved luminance control of the LED.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If a photo diode is formed of polycrystalline silicon, then the manufacturing process is simpler, but the light sensitivity is low resulting in insufficient electrical signal generation

Engineering Contradiction:
Improveease of manufactureVSAvoidlight sensitivity
Core Design Contradiction:
Ease of manufactureVSMeasurement precision

Solution Approach 1:

The photo diode is constructed using a composite structure combining polycrystalline silicon and amorphous silicon layers. The polycrystalline silicon provides structural foundation and electrical conductivity, while the amorphous silicon layer enhances light absorption efficiency. This composite material approach resolves the contradiction by maintaining manufacturing simplicity of polycrystalline silicon while adding the high light sensitivity characteristic of amorphous silicon.

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The invention changes the material parameter of the photo diode by introducing amorphous silicon with different optical and electrical properties compared to polycrystalline silicon. The amorphous silicon layer has higher light absorption coefficient and different band structure, which fundamentally changes the light sensitivity parameter while maintaining compatibility with existing polycrystalline silicon fabrication processes.

Inventive Principle:
Principle #35Parameter changes

2Ease of manufacture

If a photo diode is formed of polycrystalline silicon, then the fabrication process is easier, but the light receiving efficiency is low making luminance control difficult

Engineering Contradiction:
Improveease of manufactureVSAvoidlight receiving efficiency
Core Design Contradiction:
Ease of manufactureVSProductivity

Solution Approach 1:

The photo diode employs a composite structure with polycrystalline silicon and amorphous silicon layers. The amorphous silicon component specifically addresses the light receiving efficiency issue by providing superior optical absorption properties, while the overall structure remains compatible with standard polycrystalline silicon fabrication processes, thus maintaining ease of manufacture.

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The invention applies local quality by introducing amorphous silicon specifically in the light-receiving region of the photo diode, while other parts can remain as polycrystalline silicon. This localized application of different material properties optimizes light receiving efficiency where it is most needed without requiring complete restructuring of the entire device.

Inventive Principle:
Principle #3Local quality

3Device complexity

If a photo diode is formed of polycrystalline silicon, then the device structure is simpler, but the electrical signal generation is insufficient for effective LED luminance control

Engineering Contradiction:
Improvedevice complexityVSAvoidelectrical signal sufficiency
Core Design Contradiction:
Device complexityVSReliability

Solution Approach 1:

The photo diode uses a composite structure combining polycrystalline silicon and amorphous silicon to generate sufficient electrical signals for reliable LED luminance control. The amorphous silicon layer enhances charge carrier generation and collection efficiency, providing robust electrical signals while maintaining a relatively simple overall device structure that builds upon conventional polycrystalline silicon designs.

Inventive Principle:
Principle #40Composite materials

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The use of amorphous silicon in the photo diode significantly increases light sensitivity, enabling more accurate detection of ambient light and effective control of LED luminance, as demonstrated by a higher sensitivity ratio and increased reverse current compared to conventional polycrystalline silicon PDs.

Implementation Method 1

The PD may convert light energy, e.g., light emitted from the LED or ambient light, into an electrical signal, e.g., electric current or voltage, by generating electrons or holes in accordance with an optical absorption

Methodology Applied
Scientific EffectOptical absorption: Absorption (EM radiation)

Implementation Method 2

The PD may convert light energy, e.g., light emitted from the LED or ambient light, into an electrical signal, e.g., electric current or voltage, by generating electrons or holes

Methodology Applied
Scientific EffectPhotoelectric effect: Photoelectric Effect

Implementation Method 3

the intrinsic region including amorphous silicon... significantly increases light sensitivity, enabling more accurate detection of ambient light

Methodology Applied
Scientific EffectPhotoconductivity: Photoconductivity

Data Source

PatentUS7915649B2Light emitting display device and method of fabricating the same
Publication Date: 2011.03.29 SAMSUNG DISPLAY CO LTD
  • US7915649B2 patent drawing
  • US7915649B2 patent drawing
  • US7915649B2 patent drawing

AI summary

A light emitting display device includes a light emitting diode and a thin film transistor on a substrate, the light emitting diode and thin film transistor being electrically coupled to each other, and a photo diode on the substrate, the photo diode including an N-type doping region, a P-type doping region, and an intrinsic region between the N-type doping region and the P-type doping region, the intrinsic region including amorphous silicon.