Amorphous Sputtering Target Coating to Prevent Local Crystallization
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The challenge is to create a sputtering target with a high fraction of amorphous phase to prevent local crystallization and brittleness during the sputtering process, which can lead to target fracture and product defects.
Innovation Solution
A sputtering target with an alloy target layer having an amorphous phase fraction of 98% or more is manufactured using an iron-based amorphous alloy powder through a thermal spray coating process, such as cold spraying, to maintain the amorphous phase and composition, allowing for a single plate setup and easy control of target size and thickness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If an amorphous sputtering target is used to form an amorphous thin film, then the corrosion resistance and structural stability of the film are improved, but the target temperature increases during sputtering causing local crystallization and increased brittleness
Solution Approach 1:
The patent applies parameter changes by modifying the compositional parameters of the amorphous alloy target. Specifically, it controls the content of elements such as Fe, Ni, Cr, Mo, and B within specific ranges to adjust the glass transition temperature and crystallization resistance. This compositional optimization allows the target to maintain amorphous structure stability during sputtering while preventing local crystallization and reducing brittleness.
Solution Approach 2:
The patent uses composite materials by creating a multi-element amorphous alloy system (Fe-Ni-Cr-Mo-B) that combines different metallic elements with complementary properties. This composite structure leverages the synergistic effects of various elements: Fe and Ni for magnetic properties, Cr and Mo for corrosion resistance, and B for glass-forming ability. The composite composition enhances both the amorphous phase stability and mechanical properties, preventing brittleness during operation.
2Productivity
If the temperature of the sputtering target increases during the sputtering process, then the deposition ability is maintained, but local crystallization occurs on the surface leading to target fracture
Solution Approach 1:
The patent changes the thermal parameters of the target material by optimizing the alloy composition to achieve appropriate glass transition temperature (Tg) and crystallization temperature (Tx). The specific elemental ratios are designed to ensure that the target can withstand sputtering temperatures without crystallizing. This parameter optimization maintains deposition efficiency while preventing target fracture through enhanced thermal stability.
3Ease of manufacture
If a columnar structure or structure including grain boundaries is formed in a thin film, then the deposition process is simplified, but corrosion solution penetrates along grain boundaries accelerating corrosion
Solution Approach 1:
The patent changes the structural parameters of the thin film by controlling the deposition conditions and target composition to achieve an amorphous phase structure. The specific compositional parameters of the target (Fe: 40-70 wt%, Ni: 5-30 wt%, Cr: 5-20 wt%, Mo: 5-20 wt%, B: 0.1-5 wt%) are optimized to promote amorphous film formation. This amorphous structure eliminates grain boundaries, preventing corrosion solution penetration while maintaining good deposition characteristics.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach ensures a high amorphous fraction in both the sputtering target and the thin film, reduces brittleness, and simplifies manufacturing and repair, while maintaining the desired alloy composition and density, thus enhancing the stability and efficiency of the sputtering process.
Implementation Method 1
forming a target layer including an amorphous phase in a fraction of 98.0% or more by cold spraying an iron (Fe)-based amorphous alloy powder or an iron (Fe)-based alloy powder having a composition having an amorphous forming ability on the plate
Implementation Method 2
Sputtering is one vacuum deposition method, which accelerates plasma ionized gas such as argon in a low vacuum to collide with a target and ejects atoms to form a thin film on a plate such as a wafer, glass or a base material
Data Source
AI summary
A sputtering target according to an aspect of the present invention may comprise a substrate; and an alloy target layer, disposed on the substrate, having an amorphous phase at a ratio of 98.0% or higher.