Dual-Sided Amphi-FET Cell Layout for Dense 3D Routing

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Solution Overview

Problem

As technology nodes shrink, existing three-dimensional integrated circuits (3DICs), fin field effect transistors (FinFETs), gate all around (GAA) transistors, and backside routing structures struggle to maintain reduced device area and efficient routing options, leading to increased device size and power consumption.

Innovation Solution

The use of amphi-field effect transistors (amphi-FETs) with active devices formed on both sides of a substrate, connected through conductive elements extending through the substrate, allowing signal and power transfer without additional routing structures, and enabling mixed cell arrangements for increased gate density and reduced size.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If traditional 3DIC structures with devices formed on one side of substrate are used, then manufacturing process is simpler, but device area increases and routing efficiency decreases

Engineering Contradiction:
Improvemanufacturing process simplicityVSAvoiddevice area
Core Design Contradiction:
Ease of manufactureVSArea of moving object

Solution Approach 1:

The patent transitions from planar single-sided device formation to bi-directional formation on both sides of the substrate. Active devices are formed on both the front and back surfaces of the semiconductor substrate, utilizing the third dimension (substrate thickness) to increase functional density without expanding planar footprint. This dimensional transition enables doubled device capacity within the same area.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Adaptability or versatility

If additional routing structures are added to connect devices, then routing options increase, but device area and power consumption increase

Engineering Contradiction:
Improverouting optionsVSAvoidpower consumption
Core Design Contradiction:
Adaptability or versatilityVSUse of energy by moving object

Solution Approach 1:

The patent creates symmetric routing structures on both sides of the substrate that mirror each other. Conductive interconnects and insulation layers are formed in corresponding patterns on the front and back surfaces, establishing parallel routing paths. This copying approach provides redundant routing options while maintaining balanced electrical characteristics and minimizing additional power consumption.

Inventive Principle:
Principle #26Copying

3Quantity of substance

If technology nodes continue to shrink, then device density increases, but routing efficiency decreases and device size increases

Engineering Contradiction:
Improvedevice densityVSAvoidrouting efficiency
Core Design Contradiction:
Quantity of substanceVSDevice complexity

Solution Approach 1:

The patent divides the routing function into two separate sides of the substrate. Front-side devices connect to back-side devices through vertical conductive paths, segmenting the routing complexity into manageable layers. This segmentation allows independent optimization of front-side logic and back-side interconnect, maintaining routing efficiency as technology nodes shrink.

Inventive Principle:
Principle #1Segmentation

4Quantity of substance

If mixed cell arrangements are implemented, then gate density increases and device size reduces, but alignment complexity increases

Engineering Contradiction:
Improvegate densityVSAvoidalignment complexity
Core Design Contradiction:
Quantity of substanceVSDevice complexity

Solution Approach 1:

The patent employs asymmetric cell arrangements where different cell types and configurations are strategically placed on front and back sides of the substrate. This asymmetric布局 allows optimization of each side for specific functions while maintaining overall system integration. The asymmetry enables higher gate density by eliminating wasted space from uniform positioning constraints.

Inventive Principle:
Principle #4Asymmetry

Data Source

PatentUS12519035B2Semiconductor device and method of making
Publication Date: 2026.01.06 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US12519035B2 patent drawing
  • US12519035B2 patent drawing
  • US12519035B2 patent drawing

AI summary

A semiconductor device includes a substrate, a first cell having a first functionality, and a second cell having a second functionality. The first cell includes a first portion on a first side of the substrate, wherein the first portion includes a first conductive element; a second portion on a second side of the substrate, wherein the second portion includes a second conductive element; and a first conductive via extending through the substrate and electrically connecting the first conductive element to the second conductive element. The second cell includes a third portion on the first side of the substrate, wherein the third portion includes a third conductive element; a fourth portion on the second side of the substrate, wherein the fourth portion includes a fourth conductive element; and a second conductive via extending through the substrate and electrically connecting the third conductive element to the fourth conductive element.