Ampoule Pressure Fluctuation Reduction in Chemical Delivery Systems

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Solution Overview

Problem

Solid chemical delivery systems for substrate processing equipment often experience contamination due to initial pressure spikes when carrier gases are introduced, causing the solid-state precursor to mix with process gases and contaminate delivery lines.

Innovation Solution

A chemical delivery system with a pressure regulation line and control valves is implemented to stabilize pressure fluctuations, minimizing the mixing of the solid precursor with process gases by diverting carrier gas flow through a tee location and using fast-response valves to manage pressure.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If carrier gas is introduced into the ampoule to sublime the solid-state precursor, then process gases are delivered to the process chamber, but an initial pressure spike causes the solid-state precursor to mix with the process gases and contaminate the delivery lines

Engineering Contradiction:
Improvedelivery of process gasesVSAvoidprecursor contamination
Core Design Contradiction:
ProductivityVSObject-generated harmful factors

Solution Approach 1:

The system divides the gas flow path into two separate lines: a first supply line that delivers carrier gas to the ampoule, and a second supply line that delivers process gases to the process chamber. This segmentation prevents direct mixing at the source by creating distinct transport pathways, with the second line bypassing the ampoule region where pressure spikes occur.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

A heater is introduced as an intermediary component that warms the second supply line before process gases are delivered to the process chamber. This thermal intermediary prevents condensation of process gases in the second supply line, ensuring stable delivery without contamination from pressure fluctuations in the first supply line.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Object-generated harmful factors

If a pressure regulation line is added to stabilize pressure fluctuations, then contamination is reduced, but the device complexity increases

Engineering Contradiction:
Improvepressure fluctuationsVSAvoidsystem configuration
Core Design Contradiction:
Object-generated harmful factorsVSDevice complexity

Solution Approach 1:

The pressure regulation function is extracted from the main gas flow path and implemented separately in the second supply line through a heater. This allows pressure stabilization without adding complex regulation components to the primary carrier gas line, simplifying the overall system architecture while still achieving the desired pressure control.

Inventive Principle:
Principle #2Taking out (Extraction)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution reduces pressure fluctuations in the ampoule, minimizing contamination in the delivery lines and ensuring a more stable supply of process gases to the process chamber, thereby reducing precursor contamination.

Implementation Method 1

A carrier gas may be flowed through the ampoule to sublime the solid-state precursor to form the one or more process gases to be delivered to the process chamber

Methodology Applied
Scientific EffectSublimation: Sublimation

Data Source

PatentUS11566327B2Methods and apparatus to reduce pressure fluctuations in an ampoule of a chemical delivery system
Publication Date: 2023.01.31 APPLIED MATERIALS INC
  • US11566327B2 patent drawing
  • US11566327B2 patent drawing
  • US11566327B2 patent drawing

AI summary

Methods and apparatus to reduce pressure fluctuations in a chemical delivery system for a process chamber are provided herein. In some embodiments, a chemical delivery system for a process chamber, includes: a carrier gas supply; an ampoule fluidly coupled to the carrier gas supply via a first supply line, wherein the ampoule is configured to supply one or more process gases to the process chamber via a second supply line; an inlet valve disposed in line with the first supply line to control a flow of a carrier gas from the carrier gas supply to the ampoule; and a first control valve disposed in line with a pressure regulation line, wherein the pressure regulation line is fluidly coupled to the first supply line at a tee location between the carrier gas supply and the inlet valve.