A/M/X Photoluminescent Compounds via Solution Deposition
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Solution Overview
Problem
Existing methods for preparing metal halide thin films, such as CsSnI3, are expensive and lack control over composition and homogeneity, leading to reproducibility issues.
Innovation Solution
Development of solution-based methods for depositing A/M/X compounds, where A is an organic cation or Group 1 element, M is from Group 14, and X is from Group 17, using polar organic solvents like acetonitrile, allowing for the formation of electrically conductive and photoluminescent films with controlled composition and homogeneity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If thermal and e-beam evaporation methods are used to prepare metal halide thin films, then films can be produced, but the process is expensive and lacks control over composition and homogeneity
Solution Approach 1:
The patent replaces the mechanical vacuum-based evaporation system with a solution-based deposition method. The metal halide compounds are dissolved in polar organic solvents to form precursor solutions, which are then deposited onto substrates through simple coating techniques followed by low-temperature annealing, eliminating the need for expensive vacuum equipment while achieving precise compositional control
Solution Approach 2:
The patent changes the physical state and chemical form of the metal halide materials from solid precursors requiring high-vacuum evaporation to soluble compounds that can be processed from liquid solutions. This parameter change enables deposition at atmospheric pressure and lower temperatures, improving both cost-effectiveness and compositional control through solution chemistry
2Reliability
If high vacuum techniques are used for film deposition, then thin films can be formed, but reproducibility suffers and the process is inadequate for controlling compositions
Solution Approach 1:
The patent substitutes the complex vacuum mechanical system with a simple solution-based deposition process. The precursor solutions allow for precise control of film composition through solution concentration, and the deposition process can be performed at atmospheric pressure, dramatically improving reproducibility while eliminating vacuum system complexity
Solution Approach 2:
The patent introduces polar organic solvent molecules as intermediaries that facilitate the deposition process. These solvents dissolve the metal halide precursors and enable controlled delivery of material to the substrate, acting as a mediator that replaces the need for vacuum mechanical control while improving reproducibility
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution-based method enables the production of thin films with strong photoluminescence in the visible and near-infrared range, outperforming single crystalline InP:S wafers in intensity and allowing for the use of inexpensive, flexible plastic substrates.
Implementation Method 1
The compounds are electrically conductive and photoluminescent, characterized by photoluminescence wavelengths in the range of about 400 nm to about 2000 nm at room temperature
Data Source
AI summary
Materials comprising an A/M/X compound are provided. An A/M/X compound is a compound comprising one or more A moieties, one or more M atoms and one or more X atoms, where the A moieties are selected from organic cations and elements from Group 1 of the periodic table, the M atoms are selected from elements from Group 14 of the periodic table, and the X atoms are selected from elements from Group 17 of the periodic table. The materials include two-phase materials.