Analyte Alignment via Diffraction Pattern Analysis
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Solution Overview
Problem
Current spectrometric analysis methods require a lengthy alignment process for precise positioning of small analytes relative to a light beam, which is time-consuming and prone to misalignment unless regularly verified.
Innovation Solution
A method involving illumination of the analyte with a light beam, capturing a diffraction pattern using an imaging device, and adjusting the analyte's position based on properties of the diffraction pattern to achieve precise alignment, utilizing a lensless imaging device and motorized stages for precise movement.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If traditional microscope architecture with multiple magnification objectives is used for alignment, then alignment precision can be achieved, but alignment time becomes excessively long
Solution Approach 1:
The patent extracts the alignment function from the complex multi-objective microscope system and implements it through a simplified single-objective system with diffraction pattern analysis. The alignment information is extracted from the diffraction pattern properties (center position, symmetry, intensity distribution) rather than requiring multiple magnification stages, thereby reducing alignment time while maintaining precision.
Solution Approach 2:
The patent changes the measurement parameter from direct visual alignment through multiple magnification objectives to indirect alignment through diffraction pattern analysis. By analyzing parameters of the diffraction pattern (center position relative to beam spot, symmetry, intensity distribution), the system achieves precise alignment without the time-consuming multi-objective approach.
2Reliability
If beam position verification is performed regularly to prevent misalignment, then alignment reliability is maintained, but system complexity and operational time increase
Solution Approach 1:
The patent implements a feedback mechanism where the diffraction pattern is continuously or periodically analyzed to monitor and maintain alignment. The properties of the diffraction pattern (center position, symmetry) provide real-time feedback on alignment status, allowing the system to detect and correct misalignment automatically without requiring complex verification procedures or increasing operational time.
3Measurement precision
If the analyte position is adjusted based on diffraction pattern properties, then alignment precision is improved, but the complexity of the imaging and control system increases
Solution Approach 1:
The patent makes the single imaging objective serve multiple functions: both imaging the analyte and analyzing the diffraction pattern for alignment. The same optical path and detector are used for both purposes, eliminating the need for separate alignment optics and reducing overall system complexity while maintaining high positioning precision through diffraction pattern analysis.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method significantly reduces alignment time and ensures accurate positioning of the analyte relative to the light beam, enhancing the efficiency and precision of spectrometric analysis without the need for frequent verification.
Implementation Method 1
an imaging device taking a transmission image of the beams scattered by the analyte of the sample to establish a diffraction pattern
Data Source
Figure 1
Figure 2A~3F
Figure 4A~8
AI summary
The invention relates to a method for regulating the relative position of an analyte of a sample (16) in relation to a light beam (F), characterised in that the method comprises: illuminating the analyte of the sample (16) by means of the light beam (F); capturing, by means of an imaging device (38), a transmission image of the beams diffused by the analyte of the sample (16) in order to establish a diffraction pattern; and modifying the relative position of the analyte of the sample (16) in relation to the light beam (F) according to at least one property of the diffraction pattern.