Androstane Quencher Resist Composition for EUV Lithography
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Solution Overview
Problem
Current chemically amplified resist compositions face challenges in achieving low acid diffusion and high contrast simultaneously, particularly for ultrafine pattern formation in EUV lithography, where existing amine quenchers fail to control acid diffusion effectively.
Innovation Solution
Incorporating a nitrogen-containing carboxylic acid compound with a carboxy group substituted by a tertiary hydrocarbyl group having an androstane structure as a quencher in the resist composition, which controls acid diffusion and enhances dissolution contrast through acid labile group deprotection reactions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional amine quenchers are used in chemically amplified resist compositions, then dissolution contrast is improved, but acid diffusion control ability is insufficient
Solution Approach 1:
The patent combines a quencher molecule with an acid-labile group and a basic nitrogen-containing group into a single composite structure. This composite quencher simultaneously provides acid diffusion control through the basic group and dissolution contrast improvement through the acid-labile group, resolving the contradiction between the two functions that were previously provided by separate components.
Solution Approach 2:
The invented quencher molecule performs multiple functions: it acts as an acid scavenger to control acid diffusion, contains an acid-labile group that enhances dissolution contrast, and maintains solubility in the resist composition. This multi-functionality within a single molecule addresses the limitation of conventional quenchers that could only perform one function effectively.
2Manufacturing precision
If acid diffusion is reduced to improve resolution, then manufacturing precision improves, but sensitivity decreases
Solution Approach 1:
The patent creates local chemical environment changes by placing acid-labile groups at specific locations within the quencher molecule. These groups are strategically positioned to provide enhanced dissolution contrast in the exposed regions without increasing overall acid diffusion, thus maintaining resolution while improving sensitivity through better local differentiation between exposed and unexposed areas.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces line width roughness (LWR) and critical dimension uniformity (CDU) while maintaining high sensitivity, particularly in positive resist compositions, by limiting acid diffusion and improving solubility in exposed regions.
Implementation Method 1
Chemically amplified resist compositions comprising an acid generator capable of generating an acid upon exposure to light or EB
Implementation Method 2
a high acid diffusion control ability due to the acid labile group of giant androstane structure, and an improvement in dissolution contrast as a result of deprotection of the acid labile group
Data Source
AI summary
A chemically amplified resist composition comprising a quencher and an acid generator is provided. The quencher is a nitrogen-containing carboxylic acid compound having a carboxy group whose hydrogen is substituted by a tertiary hydrocarbyl group having an androstane structure. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.