Angled Electron Beam Etching for Uniform Waveguide Gratings
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Solution Overview
Problem
Current methods for fabricating waveguides, used in augmented and virtual reality, face challenges due to non-uniform properties and inefficiencies in displaying virtual image overlays on ambient environments, particularly in achieving precise angled gratings for effective light propagation.
Innovation Solution
The development of an electron beam etching apparatus with a segmented surface and high secondary electron emission coefficient material, capable of generating angled electron beams to form precise angled gratings on waveguides, enhancing the fabrication of nanostructured optical devices like waveguide combiners and metalenses.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional waveguide fabrication methods are used, then the fabrication process is simple, but the waveguide properties are non-uniform
Solution Approach 1:
The second electrode is divided into multiple segments with different angled surfaces, allowing independent control of electron beam angles for different regions of the waveguide. This segmentation enables precise control over grating formation in various zones, achieving uniform waveguide properties throughout the structure while maintaining a manageable fabrication process
Solution Approach 2:
Different segments of the second electrode provide locally optimized electron beam angles tailored to specific regions of the waveguide. This local quality approach ensures that each portion of the waveguide receives the appropriate beam angle for its specific requirements, resulting in overall uniformity while avoiding the need for completely complex fabrication procedures
2Manufacturing precision
If angled ion beam fabrication is used, then precise angled gratings can be formed, but the fabrication process becomes complex and time-consuming
Solution Approach 1:
The patent replaces the mechanical ion beam system with an electron beam system for generating plasma. The electron beam apparatus with segmented electrode can achieve the same angled grating precision while operating more efficiently. The electron beam's ability to be precisely controlled through electric fields and its higher interaction cross-section with materials enables efficient material removal and plasma generation without the complexity of ion beam delivery systems
Solution Approach 2:
The invention changes the fundamental parameter from ion beam to electron beam for plasma generation. This parameter change maintains the ability to form precise angled gratings while significantly improving fabrication efficiency. The electron beam's properties allow for higher power density, faster processing speeds, and more efficient plasma generation compared to ion beam methods
3Productivity
If vertical electron beam is used, then the fabrication process is efficient, but precise angled gratings cannot be formed
Solution Approach 1:
The second electrode is segmented into multiple sections, each with a specific angled surface. This segmentation allows the efficient electron beam system to generate precisely angled electron beams by directing them through different electrode segments. The result is maintained fabrication efficiency while achieving the precise angled grating formation that was previously only possible with complex ion beam systems
Solution Approach 2:
The patent introduces angular dimensionality to the electron beam system through the segmented electrode design. Instead of a single vertical beam, the segmented electrode creates multiple electron beams at different angles by utilizing the angled surfaces of each segment. This dimensional addition enables precise angled grating formation while maintaining the efficiency benefits of electron beam technology
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach improves the uniformity and efficiency of waveguide fabrication, enabling better light propagation and increased viewing angles for virtual image overlays, addressing the limitations of existing waveguide fabrication techniques.
Implementation Method 1
a first beam source positioned to generate a first beam at a first angle relative to a substrate plane... electrons are projected from the angled electron beam source toward the waveguide to form fins
Implementation Method 2
The electron beam is directed onto the substrate to physically sputter and vaporize material from the substrate surface
Implementation Method 3
a first beam source positioned to generate a first beam at a first angle relative to a substrate plane... ions are projected from the angled ion beam source toward the waveguide
Data Source
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AI summary
Aspects of the disclosure relate to apparatus for the fabrication of waveguides. In one example, an angled ion source is utilized to project ions toward a substrate to form a waveguide which includes angled gratings, In another example, an angled electron beam source is utilized to project electrons toward a substrate to form a waveguide which includes angled gratings. Further aspects of the disclosure provide for methods of forming angled gratings on waveguides utilizing an angled ion beam source and an angled electron beam source.