Angled Channel Structures for Helium Ion Beam Imaging
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Solution Overview
Problem
Particle implantation during exposure to particle beams, such as helium ion beams, leads to sample distortion and damage, particularly in semiconductor devices, resulting in inaccurate and distorted images due to bubble formation and swelling.
Innovation Solution
Forming channels in the sample to allow particles to exit, adjusting the average energy of the particle beam to transmit ions through the sample, and heating the sample to increase diffusion rates of implanted particles, thereby reducing particle implantation and sample damage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a particle beam is used for sample imaging, then imaging resolution and quality are improved, but particle implantation causes sample distortion and damage
Solution Approach 1:
The sample is segmented into multiple regions with different channel configurations. Some regions have channels oriented at angles to the surface, while others have channels normal to the surface. This segmentation allows different parts of the sample to be imaged with optimized particle extraction paths, reducing overall implantation damage while maintaining high-resolution imaging capability.
Solution Approach 2:
The invention introduces a spatial dimension by forming channels at different orientations (angled and normal to the surface) rather than using a single flat surface configuration. This dimensional approach creates multiple particle extraction pathways, allowing particles to leave the sample through channel walls rather than requiring surface emission, thereby reducing implantation damage while preserving imaging resolution.
2Measurement precision
If particle beam exposure time is increased to improve image quality, then imaging precision is improved, but accumulated sample damage increases
Solution Approach 1:
Channels are formed in the sample before particle beam exposure begins. This preliminary action creates pre-established particle extraction pathways that will be active during the entire imaging process, allowing particles to continuously escape through channel walls rather than accumulating in the bulk material. This prevents damage accumulation over extended exposure times while maintaining imaging precision.
Solution Approach 2:
The channels act as intermediary structures that facilitate particle extraction from the sample bulk to the exterior environment. By providing this intermediate pathway, particles can leave the sample through the channel walls during beam exposure, preventing their accumulation and the associated damage that would otherwise occur with prolonged imaging.
3Object-affected harmful factors
If channels are formed in the sample to reduce particle implantation, then sample damage is reduced, but device complexity increases
Solution Approach 1:
The invention creates a porous-like structure within the sample by forming channels that extend through the material. These channels provide pathways for particle extraction, effectively reducing implantation damage. The channel structure, while adding some complexity, creates a controlled porosity that enables continuous particle removal during beam exposure, maintaining sample integrity throughout the imaging process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method reduces particle implantation, minimizing sample distortion and damage, enabling high-quality imaging with reduced imaging artifacts and preventing sample destruction, allowing for non-destructive inspection and higher resolution images using ion beams instead of electron beams.
Implementation Method 1
exposing a portion of the sample above the channel to a particle beam to cause particles to leave the surface of the sample
Implementation Method 2
heating the sample during the exposure to the particle beam
Implementation Method 3
heating the sample to increase diffusion rates of implanted particles
Data Source
AI summary
Methods disclosed herein include: (a) forming a channel in a sample, the channel extending one micron or more along a direction oriented at an angle to a surface of the sample; (b) exposing a portion of the sample above the channel to a particle beam to cause particles to leave the surface of the sample; and (c) forming an image of the sample based on particles that leave the surface.