Angled Injector Channels for Uniform Gas Flow
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Solution Overview
Problem
Current photoresist strippers face challenges in achieving uniform gas flow and high strip rates due to the complexity and cost of baffle designs, as well as the inefficiency of showerhead systems, which result in reduced radical ionization and increased radical recombination, leading to lower strip rates and non-uniformity.
Innovation Solution
A gas chamber design featuring a compact injector with angled channels and a funnel-shaped upper chamber body that disperses gas uniformly without creating excessive back pressure, minimizing radical recombination and enhancing strip rate while being economical to manufacture.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a baffle system with multiple holes of different sizes is used to disperse gas uniformly, then gas flow uniformity is improved, but device complexity and manufacturing cost increase
Solution Approach 1:
The gas dispersal function is segmented into multiple nozzles arranged in a specific pattern, where each nozzle contributes to the overall uniform gas distribution. This segmentation allows for simpler individual components while achieving the desired uniformity through their collective arrangement and operation.
Solution Approach 2:
The invention changes the operational parameters by maintaining high gas flow rates that prevent the need for complex hole size variations. By utilizing the dynamic behavior of high-velocity gas flow, the system achieves uniform dispersal without requiring precisely engineered varying hole sizes, thus simplifying the baffle design.
2Ease of operation
If a showerhead system is used to create back pressure, then gas flow control is improved, but radical ionization efficiency decreases and radical recombination increases
Solution Approach 1:
The system dynamically balances gas flow control and radical generation by using a remote plasma source that operates independently from the chamber pressure control. This allows the showerhead to provide necessary back pressure for flow control while the remote plasma source maintains high ionization efficiency, as the plasma is generated in a separate region不受chamber pressure effects.
3Volume of moving object
If the vertical distance between gas entrance hole and wafer is minimized for compactness, then chamber size is reduced, but gas flow uniformity becomes difficult to achieve
Solution Approach 1:
The invention transitions from relying solely on vertical distance for gas dispersal to using a two-dimensional nozzle arrangement pattern. The nozzles are positioned in specific x-y coordinates with controlled angular orientations, creating uniform gas distribution through spatial arrangement in multiple dimensions rather than depending on vertical distance alone. This allows for compact chamber design while maintaining flow uniformity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution achieves improved gas flow and strip rate without the need for expensive baffles or showerheads, reducing radical recombination and maintaining uniformity, resulting in a more efficient and cost-effective photoresist removal process.
Implementation Method 1
a plasma source 440 that provides a source of radicals
Implementation Method 2
The gas flow is shaped by angles of channels 412, angles of ends of the channels, and angles of internal surfaces of the chamber
Data Source
AI summary
A gas chamber contains upper and lower chamber bodies forming a cavity, a heating chuck for a wafer, a remote gas source, and an exhaust unit. Gas is injected into the cavity through channels in an injector. Each channel has sections that are bent with respect to each other at a sufficient angle to substantially eliminate entering light rays entering the channel from exiting the channel without reflection. The channels have funnel-shaped nozzles at end points proximate to the chuck. The injector also has thermal expansion relief slots and small gaps between the injector and mating surfaces of the chamber and gas source. The temperature of the injector is controlled by a cooling liquid in cooling channels and electrical heaters in receptacles of the injector. The upper chamber body is funnel-shaped and curves downward at an end of the upper chamber body proximate to the chuck.