Angled Nozzle Outlets for Uniform Plasma Etch
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Solution Overview
Problem
Current nozzle designs for plasma processing in electronic device manufacturing result in non-uniform plasma etch and deposition profiles, leading to defects such as striations and tapering in high aspect ratio vias and trenches, which affect yield and increase manufacturing costs.
Innovation Solution
A nozzle design with an inlet portion having a side surface parallel to a vertical axis and an outlet portion with outlets at angles other than right angles, providing a more uniform gas flow distribution across the wafer, preventing localized plasma ignition, and enhancing plasma processing uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a standard nozzle design is used for plasma processing, then the device complexity is low and ease of manufacture is high, but the plasma etch and deposition uniformity is poor, leading to profile variations and defects
Solution Approach 1:
The nozzle is divided into multiple functional sections: an inlet portion with substantially parallel side surfaces, an outlet portion with angled outlets, and intermediate transition sections. This segmentation allows each section to be optimized for its specific function - the inlet portion for uniform gas distribution, the transition sections for flow control, and the outlet portion for directed plasma delivery - thereby achieving improved plasma processing uniformity while maintaining manufacturing feasibility through modular design
Solution Approach 2:
Different portions of the nozzle are given different geometric properties tailored to their specific functions. The inlet portion has substantially parallel side surfaces to ensure uniform gas flow distribution. The outlet portion features outlets at angles between 10-70 degrees relative to the longitudinal axis to control plasma direction and distribution. Intermediate sections have varying cross-sectional areas to manage flow transitions. This local differentiation of geometric qualities enables precise control over plasma uniformity without requiring complete redesign of the entire nozzle structure
2Manufacturing precision
If the outlet portion has outlets at angles other than right angles, then the gas flow distribution uniformity is improved, but the manufacturing complexity increases
Solution Approach 1:
The outlet angles are optimized within a specific range (10-70 degrees relative to the longitudinal axis) to achieve the desired gas flow distribution uniformity. This parameter optimization balances plasma processing performance with manufacturing considerations. The angled outlets create more uniform plasma distribution patterns compared to perpendicular outlets, while the specific angle range ensures that the geometry remains manufacturable using conventional fabrication techniques
3Manufacturing precision
If the inlet portion has substantially parallel side surfaces, then the plasma profile uniformity is improved, but the device complexity increases
Solution Approach 1:
The nozzle employs asymmetric geometry where the inlet portion has substantially parallel side surfaces that extend for a significant portion of the nozzle length. This asymmetric design creates a flow distribution pattern that improves plasma profile uniformity across the substrate. The parallel side surfaces maintain a consistent cross-sectional area over the inlet portion, which stabilizes gas flow and enhances plasma uniformity, while the overall nozzle remains asymmetric to accommodate the angled outlets and transition sections
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The new nozzle design achieves significantly improved uniformity of plasma processing, reducing defects and manufacturing costs by ensuring consistent gas flow and preventing plasma non-uniformity issues.
Implementation Method 1
providing a more uniform gas flow distribution across the wafer
Data Source
AI summary
A nozzle for uniform plasma processing comprises an inlet portion and an outlet portion. The inlet portion has a side surface substantially parallel to a vertical axis. The inlet portion comprises a plurality of gas channels. The outlet portion is coupled to the inlet portion. The outlet portion comprises a plurality of outlets. At least one of the outlets is at an angle other than a right angle relative to the vertical axis.