Angled Slit Design for CT Electron Beam Measurement
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Solution Overview
Problem
Existing slit designs in electron beam diagnostic systems face limitations in measuring smaller diameter beams due to the economic and practical challenges of manufacturing finer slits in refractory metals, and struggle with accurately capturing beams larger than the slit width, leading to reduced resolution and errors in computed tomographic reconstructions.
Innovation Solution
The introduction of an angled slit design where the slit walls are oriented at an angle relative to the electron beam path, effectively reducing the slit width and allowing for the measurement of both smaller and larger diameter beams by adjusting the effective slit width, enabling more precise analysis and higher resolution without the need for finer slit manufacturing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If slits with smaller width than 100 microns are manufactured in refractory metal disk, then measurement precision for small diameter beams is improved, but manufacturing cost and difficulty increase significantly
Solution Approach 1:
The patent changes the geometric parameters of the slit by introducing an angle θ relative to the beam path. This transforms the effective slit width from the actual physical width to width*cos(θ), allowing a 100 micron slit to function as a smaller effective aperture without requiring manufacturing of physically smaller slits
Solution Approach 2:
The patent adds an angular dimension to the slit orientation, transforming a one-dimensional width parameter into a two-dimensional configuration problem. By orienting the slit at an angle θ to the beam path, the effective width is reduced while maintaining the same physical slit dimensions, thus avoiding the manufacturing challenges of sub-100 micron slits
2Ease of manufacture
If slits with larger width are used, then ease of manufacture is improved, but measurement precision for small diameter beams deteriorates due to beam passing entirely through the slit
Solution Approach 1:
The patent modifies the effective slit width parameter by introducing an angular orientation θ. This allows a manufacturable 100 micron slit to present an effectively smaller width (width*cos(θ)) to the beam, enabling precise measurement of small diameter beams without requiring physically smaller slits
3Device complexity
If conventional parallel slits are used, then device complexity is minimized, but adaptability to different beam diameters is reduced
Solution Approach 1:
The angled slit design provides multi-functionality by enabling the same slit to effectively measure different beam diameter ranges. By adjusting the angle θ, a single slit configuration can adapt to measure both small and large diameter beams, replacing the need for multiple slit sizes
Solution Approach 2:
The patent uses angular orientation as a可调 parameter to adapt the slit's effective width to match different beam diameters. This single parameter change (angle θ) provides versatility across a wide range of beam sizes while maintaining device simplicity
Data Source
AI summary
Computed tomographic method and apparatus includes an electron or ion beam having a beam axis, a refractory metal disk; at least one slit in the refractory metal disk that receive the beam, wherein the slit is at an angle to the beam axis; a beam entrance opening in the slit that allows the beam to enter; an effective beam exit opening in the slit that allow the beam to exit, wherein the beam effective exit opening is smaller than the beam entrance opening; and a system for moving the beam across the refractory metal disk, wherein the beam enters the slit through the beam entrance opening and exits the slit through the effective beam exit opening; and a computed tomographic device for measuring the beam that enters and exits the slit for analyzing the beam.