Annular Loader for CVI Densification of 3D Substrates

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Solution Overview

Problem

Existing chemical vapor infiltration methods struggle to achieve uniform densification of complex three-dimensional porous substrates, leading to densification gradients and suboptimal mechanical performance in parts like aeroengine blades.

Innovation Solution

A loader device with annular stages and radial gas flow control, allowing for simultaneous densification of multiple substrates with precise gas distribution, minimizing gradients and increasing loading capacity and reaction chamber efficiency.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If multiple substrates are loaded simultaneously to increase throughput, then productivity increases, but densification uniformity deteriorates due to flow control difficulties

Engineering Contradiction:
ImprovethroughputVSAvoiddensification uniformity
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The reaction chamber is divided into multiple independent zones, each equipped with separate gas inlet and outlet ports. This segmentation allows independent flow control for each substrate location, enabling uniform densification across multiple substrates loaded simultaneously without compromising productivity.

Inventive Principle:
Principle #1Segmentation

2Adaptability or versatility

If complex three-dimensional substrates are densified, then product versatility increases, but flow control difficulty increases leading to densification gradients

Engineering Contradiction:
Improvesubstrate shape complexityVSAvoidflow control complexity
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

Each zone is designed with localized gas inlet and outlet ports positioned to match the specific geometry and orientation of the substrates in that zone. This local customization of flow paths ensures appropriate gas distribution for complex three-dimensional substrates without requiring overall system complexity to increase proportionally.

Inventive Principle:
Principle #3Local quality

3Manufacturing precision

If directed flow chemical vapor infiltration is used to achieve uniform densification, then manufacturing precision improves, but device complexity increases compared to free-flow methods

Engineering Contradiction:
Improvedensification uniformityVSAvoidloading device complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The loading device structure itself, with its annular stages and radially arranged substrates, naturally facilitates directed gas flow from the center outward. This self-organizing geometry reduces the need for additional complex flow control mechanisms while achieving uniform densification through the inherent design configuration.

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution enables uniform densification of complex three-dimensional substrates, enhancing the mechanical performance and throughput of composite material parts while reducing loading and unloading time and risk.

Implementation Method 1

densifying porous substrates by means of chemical vapor infiltration consists in placing the substrates in a reaction chamber of an infiltration installation by using support tooling, and then in admitting a reagent gas into the chamber, with one or more ingredients of the reagent gas being precursors of the material that is to be deposited within the substrates

Methodology Applied
Scientific EffectChemical vapor infiltration: Chemical Vapour Deposition

Implementation Method 2

Infiltration conditions, and in particular the composition and the flow rate of the reagent gas, and also the temperature and the pressure inside the chamber, are selected so as to enable the gas to diffuse within the accessible internal pores of the substrates

Methodology Applied
Scientific EffectDiffusion: Diffusion

Data Source

PatentUS10233540B2Device for loading porous substrates of three-dimensional shape in order to be densified by directed flow chemical vapor infiltration
Publication Date: 2019.03.19 SAFRAN CERAMICS SA
  • US10233540B2 patent drawing
  • US10233540B2 patent drawing
  • US10233540B2 patent drawing

AI summary

A loader device for loading porous substrates of three-dimensional shapes extending mainly in a longitudinal direction into a reaction chamber of an infiltration oven for densification of the preforms by directed flow chemical vapor infiltration. The device comprising at least one annular loader stage formed by first and second annular vertical walls arranged coaxially relative to each other and defining between them an annular loader space for the porous substrates to be densified. First and second plates respectively cover the bottom portion and the top portion of the annular loader space. The first and second annular vertical walls include support elements arranged in the annular loader space so as to define between them unit loader cells, each for receiving a respective substrate to be densified. The device also comprises gas feed orifices and gas exhaust orifices in the vicinity of each unit loader cell.