Annular Member Mounting for Precise Plasma Processing Alignment
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Solution Overview
Problem
Existing plasma processing systems face challenges in accurately positioning and efficiently replacing annular members, such as edge rings, due to their exposure to plasma and wear, which affects uniformity and precision in plasma processing results.
Innovation Solution
A plasma processing system with a transfer device that includes a substrate support with insertion holes, lifters, and a temperature adjustment mechanism, along with a transfer mechanism, to precisely position and mount annular members by controlling temperature and alignment using lifters and concave portions, ensuring accurate placement and replacement of annular members.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If manual positioning methods are used for annular members, then operation simplicity is maintained, but positioning precision deteriorates
Solution Approach 1:
The annular member automatically positions itself on the substrate support through the interaction between its outer peripheral surface and the tapered inner peripheral surface of the recess. The gravity and geometric constraint enable self-positioning without external intervention, achieving high positioning precision while avoiding complex positioning mechanisms.
Solution Approach 2:
The recess is designed with a tapered inner peripheral surface where the diameter decreases toward the bottom. This parameter change in geometry creates a self-aligning feature that guides the annular member into the correct position, improving positioning precision without adding complex mechanical positioning devices.
2Reliability
If annular members are frequently replaced due to wear, then processing quality is maintained, but productivity is reduced
Solution Approach 1:
The transfer apparatus pre-grasps the annular member before replacement is needed, and the mounting structure is pre-configured with the tapered recess ready to receive the new annular member. This preliminary preparation enables quick replacement without complex alignment procedures, maintaining productivity while ensuring processing quality through consistent positioning.
Solution Approach 2:
The manual positioning and mounting operations are replaced by an automated transfer apparatus that uses grasping and transfer mechanisms. This substitution eliminates time-consuming manual alignment and mounting steps, improving replacement efficiency while maintaining reliable processing quality through consistent automated positioning.
3Manufacturing precision
If non-uniform plasma exposure occurs on annular members, then processing uniformity is compromised, but device complexity increases
Solution Approach 1:
The tapered recess design creates a stable equilibrium position where the annular member naturally settles with uniform orientation. This geometric constraint ensures that the annular member is always positioned at the same potential state during plasma exposure, achieving processing uniformity without complex active control mechanisms.
Solution Approach 2:
The tapered geometry of the recess creates a parameter change in the radial direction that forces the annular member into a specific orientation. This geometric parameter change ensures uniform plasma exposure by eliminating positional variability, achieving manufacturing precision without adding complex positioning control systems.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Ensures precise and uniform plasma processing by accurately positioning annular members, maintaining processing quality, and facilitating efficient replacement without manual intervention, thereby enhancing the overall processing efficiency and consistency.
Implementation Method 1
a preset temperature at which a position of each of the concave portions of the annular member matches positions of the corresponding lifter and insertion hole
Data Source
AI summary
A plasma processing system is provided. The system comprises a plasma processing apparatus, a transfer apparatus connected to the plasma processing apparatus, and a controler. The plasma processing apparatus includes a substrate support including a support unit for a substrate as well as an annular member disposed to surround the substrate. The substrate support includes a plurality of insertion holes passing through the support unit, lifters to elevate/lower the annular member through the insertion holes and a temperature adjustment mechanism for adjusting a temperature of the support unit. The transfer apparatus includes a transfer mechanism for transferring the annular member to the substrate support. The annual member has includes concave portions in its bottom surface, into which upper end the lifters are fitted.