Annular Plasma Deflector Layout for Uniform Substrate Processing
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Solution Overview
Problem
Plasma processing equipment struggles to maintain uniformity of plasma distribution over substrates, leading to nonuniform process results such as uneven deposition thickness, despite the use of showerheads and gas flow devices.
Innovation Solution
The implementation of annular deflectors positioned within the process chamber to deflect plasma species, such as ions and radicals, ensuring a more uniform plasma concentration across the substrate by redirecting plasma away from areas of higher concentration and towards areas of lower concentration.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If showerheads and gas flow devices are used to provide uniform plasma, then plasma distribution should be improved, but nonuniformities remain in the plasma over substrates
Solution Approach 1:
A deflector plate is introduced as an intermediary component between the plasma source and substrate. The deflector plate redirects plasma species through its angled surface, actively modifying the plasma distribution pattern to achieve uniformity that cannot be obtained by gas flow devices alone.
Solution Approach 2:
The deflector plate changes the spatial distribution parameters of plasma species by redirecting them at specific angles. This parameter modification allows plasma to be redistributed from high-concentration regions to low-concentration regions, achieving uniform plasma coverage.
2Productivity
If plasma concentration is increased to improve process results, then deposition rate improves, but nonuniformity in plasma distribution worsens
Solution Approach 1:
The deflector plate serves as a mediator that decouples plasma concentration from uniformity. It allows high plasma concentration to be maintained while redistributing the plasma species uniformly across the substrate, resolving the trade-off between productivity and precision.
Solution Approach 2:
The deflector plate segments the plasma flux into different angular directions, redirecting plasma species from concentrated regions to dispersed regions. This segmentation enables independent control of plasma intensity and distribution uniformity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The use of deflectors significantly improves the uniformity of plasma concentration over substrates, enhancing the consistency of plasma processes like deposition and etching by adjusting plasma distribution patterns, thereby improving process outcomes.
Implementation Method 1
The deflectors can improve a uniformity of plasma concentration over different portions of the substrate by deflecting plasma species (e.g., ions and radicals) as the plasma species move from the plasma source towards the substrate
Data Source
AI summary
A process chamber is provided including a chamber body disposed around a process volume, the process volume bounded by one or more interior side walls; a substrate support in the process volume; a plasma source disposed over the substrate support, the plasma source having a top and one or more sides disposed around a plasma-generating volume; and a first deflector positioned at least partially in the process volume, the first deflector comprising an annular body having a top, a bottom, one or more outer side surfaces connecting the top with the bottom, and one or more inner side surfaces connecting the top with the bottom. The one or more outer side surfaces of the annular body are spaced apart from the one or more interior side walls of the process volume.