Annular Substrate Support for Photolithography Stability
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Solution Overview
Problem
During photolithography, substrate deformation caused by particles on the substrate or stage can lead to unexpected results due to uneven gas distribution and instability, affecting pattern formation on semiconductor substrates.
Innovation Solution
A lithographic apparatus with a substrate stage that uses a substrate support system with annular openings for gas flow and evacuation, combined with a substrate edge holder to maintain the substrate's position, ensuring even gas distribution and stability by adjusting gas pressure and vacuum levels.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If particles are present on the substrate backside or stage top surface, then substrate deformation occurs, but manufacturing precision deteriorates
Solution Approach 1:
The harmful particles are removed from the system by implementing a gas flow system that blows away particles from the substrate backside and stage surface, preventing them from causing substrate deformation while maintaining manufacturing precision
Solution Approach 2:
A gas flow intermediary is introduced between the particles and substrate to prevent direct contact and deformation. The gas acts as a mediator that carries particles away from critical areas, protecting the substrate from harmful particle-induced deformation
2Reliability
If gas flow is used to remove particles, then substrate stability improves, but device complexity increases
Solution Approach 1:
The gas distribution system is segmented into multiple gas inlets positioned at different locations around the substrate. This segmentation allows targeted particle removal from specific areas (substrate backside, stage surface) while keeping each gas inlet simple in structure, thereby improving substrate stability without excessive complexity
Solution Approach 2:
The gas flow system is designed to automatically remove particles through passive gas flow patterns created by the inlets. The system self-regulates particle removal without requiring complex control mechanisms, maintaining substrate stability while minimizing device complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution stabilizes the substrate, preventing deformation and ensuring accurate pattern formation by maintaining a consistent gap between the substrate and the support, thereby improving the reliability of photolithography processes.
Implementation Method 1
a source is coupled to the first opening and is configured to supply first gas/air to a bottom surface of the substrate through the first opening
Implementation Method 2
a vacuum is configured to draw/evacuate second gas/air along a top surface of the substrate support through second openings
Data Source
AI summary
An apparatus for processing the substrate includes a substrate stage and a source. The substrate stage is configured to support a substrate thereon. The substrate stage includes a substrate support formed with a first opening therein. The first opening is an annular opening. The source is coupled to the first opening and is configured to supply first gas/air to a bottom surface of the substrate through the first opening.