Anodic Oxide Film Structure for Semiconductor Durability
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Anodic oxide films used in semiconductor and display fields face challenges due to their weak strength, vulnerability to harsh environments, and susceptibility to chemical etching solutions, particularly alkaline solutions, which affects their durability and reliability in MEMS processes.
Innovation Solution
The development of an anodic oxide film structure with a first thin film layer formed by chemical substitution of primary and secondary reactants, providing increased strength and chemical resistance, and a non-porous barrier layer with a porous layer, where the thin film layer is located inside the pores, enhancing durability and preventing crack exposure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Volume of moving object
If the anodic oxide film thickness is reduced, then the film can be manufactured as a thin plate for semiconductor and display applications, but the strength of the film becomes weak
Solution Approach 1:
The patent applies composite materials by combining the anodic oxide film with additional protective layers or modifying the film composition to create a multi-layer structure. This allows the film to maintain thin dimensions while gaining enhanced strength and chemical resistance through the composite structure, directly resolving the contradiction between thinness and strength.
2Temperature
If the anodic oxide film is used in harsh environments, then it can function in high-temperature processing atmospheres, but the film becomes vulnerable to corrosion and chemical etching solutions
Solution Approach 1:
The patent uses composite materials by creating a multi-layer protective structure where the anodic oxide film is combined with additional layers that provide superior chemical resistance. This composite approach allows the film to withstand both high-temperature processing and harsh chemical environments, resolving the contradiction between temperature resistance and chemical reliability.
Solution Approach 2:
The patent applies beforehand cushioning by pre-applying protective coatings or treating the anodic oxide film surface before exposure to harsh environments. This preparatory protection creates a buffer that prevents direct contact between the film and corrosive chemicals, thereby maintaining reliability in harsh environments while preserving the high-temperature functionality.
3Strength
If a thin film layer is applied to increase strength, then the anodic oxide film strength improves, but the film becomes vulnerable to crack exposure and outgassing
Solution Approach 1:
The patent applies the nested doll principle by creating a multi-layer structure where protective layers are positioned within and around the anodic oxide film. This nested configuration ensures that even if surface cracks occur, the underlying layers provide continued protection and prevent outgassing, thereby maintaining reliability while preserving the strength benefits of the thin film structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The enhanced anodic oxide film structure exhibits improved durability, chemical resistance, and abrasion resistance, effectively preventing crack exposure and outgassing issues, thereby increasing the overall performance and reliability of the product in harsh environments.
Implementation Method 1
a first thin film layer provided on at least one surface of the anodic oxide film sheet, in which the first thin film layer includes a plurality of first monoatomic layers formed by repeatedly performing a cycle of adsorbing a first primary precursor and supplying a first secondary reactant different from the first primary precursor to form a first monoatomic layer through chemical substitution of the first primary precursor and the first secondary reactant
Implementation Method 2
adsorbing a first primary precursor and supplying a first secondary reactant different from the first primary precursor to form a first monoatomic layer through chemical substitution
Implementation Method 3
the anodic oxide film sheet may include a non-porous barrier layer in which pores are not formed
Implementation Method 4
the anodic oxide film sheet may include a non-porous barrier layer in which pores are not formed, and a porous layer disposed on the barrier layer and having pores formed therein
Data Source
AI summary
Proposed is an anodic oxide film structure that includes an anodic oxide film sheet and has high strength, chemical resistance and corrosion resistance.