Electrode and Anodized Structure Patterning With Dual-Thickness Photoresist

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Solution Overview

Problem

Traditional display manufacturing processes are complex and costly, with many steps required to produce a display, and there is a need to reduce the number of steps to enhance efficiency and lower costs.

Innovation Solution

A method of manufacturing a structure with an electrode and an anodized part involves forming a top metal layer on a substrate, creating a patterned photoresist with different mask portions, anodizing the metal layer, removing the first mask portion, etching the metal layer, and reflowing the photoresist to optimize the process.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If traditional display manufacturing processes are used, then manufacturing precision and reliability are maintained, but the number of manufacturing steps is large, increasing cost and reducing efficiency

Engineering Contradiction:

Improvemanufacturing efficiencyVSAvoidnumber of manufacturing steps

Core Design Contradiction:

ProductivityVSDevice complexity

Solution Approach 1:

The patent combines multiple manufacturing steps into a single integrated process. Specifically, the patterned photoresist layer serves dual functions as both a mask for anodization and a mask for subsequent etching, eliminating the need for separate mask layers and steps. The anodization and etching processes are performed sequentially using the same photoresist pattern, reducing the overall number of manufacturing steps while maintaining precision.

Inventive Principle:

Principle #5Merging (Combining)

Solution Approach 2:

The photoresist layer is designed to perform multiple functions: it acts as a protective mask during anodization to define the anodized segment pattern, and subsequently serves as the mask for etching the metal layer to create the electrode pattern. This multi-functional use of a single material layer streamlines the manufacturing process and reduces complexity.

Inventive Principle:

Principle #6Universality (Multi-functionality)

2Productivity

If the number of manufacturing steps is reduced, then cost decreases and efficiency improves, but control precision over the anodized segment may be compromised

Engineering Contradiction:

Improvemanufacturing efficiencyVSAvoidcontrol precision of anodized segment

Core Design Contradiction:

ProductivityVSManufacturing precision

Solution Approach 1:

The photoresist layer is designed with spatially varying thickness: a first thickness in regions where precise anodization control is needed, and a second thickness in other regions. This local variation in thickness allows different portions of the photoresist to provide different levels of protection during anodization, enabling precise control over the anodized segment formation while maintaining process efficiency.

Inventive Principle:

Principle #3Local quality

Solution Approach 2:

The photoresist layer is formed with a predetermined thickness pattern before the anodization process begins. This preliminary structuring of the mask layer ensures that the subsequent anodization and etching processes will produce the desired precise patterns without requiring additional control steps during the actual manufacturing process.

Inventive Principle:

Principle #10Preliminary action

3Device complexity

If a single photoresist layer is used for both anodization and etching masks, then the number of steps is reduced, but the photoresist must withstand different process conditions

Engineering Contradiction:

Improvenumber of mask layersVSAvoidphotoresist performance under different conditions

Core Design Contradiction:

Device complexityVSReliability

Solution Approach 1:

The photoresist layer's effectiveness is optimized by controlling its thickness parameter. The first thickness region provides sufficient protection during anodization while allowing the desired pattern formation, and the same region serves as an effective mask during etching. By carefully selecting and varying the thickness parameter across different regions, the single photoresist layer can reliably withstand both anodization and etching process conditions.

Inventive Principle:

Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method reduces the number of steps in display manufacturing, thereby decreasing costs and improving efficiency while allowing for precise control of the anodized segment, which serves as a channel protect structure.

Implementation Method 1

anodizing the top metal layer through the top patterned photoresist to form an anodized segment

Methodology Applied

Scientific EffectAnodizing: Anodising

Implementation Method 2

reflowing the top patterned photoresist after the anodizing and before the etching

Methodology Applied

Scientific EffectReflow:

Data Source

PatentUS20250191924A1Method of manufacturing structure having electrode and anodized part

Publication Date: 2025.06.12 MIKRO MESA TECH

AI summary

A method of manufacturing a structure having an electrode and an anodized part includes: forming a top metal layer on a substrate; forming a top patterned photoresist on the top metal layer to expose a portion of a top surface of the top metal layer, in which the top patterned photoresist has a first mask portion and a second mask portion thicker than the first mask portion; anodizing the top metal layer through the top patterned photoresist to form an anodized segment; removing the first mask portion after the anodizing; etching the top metal layer through the top patterned photoresist after the removing the first mask portion to form a top metal pattern; and reflowing the top patterned photoresist after the anodizing and before the etching.