Antenna Conductor Cooling for Plasma Stability
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional plasma processing devices face challenges in stabilizing plasma generation due to heat-induced fluctuations in electrostatic capacity and antenna conductor damage, leading to unstable plasma generation and electrostatic coupling issues.
Innovation Solution
The plasma processing device incorporates an antenna conductor with a cooling liquid flow path and a variable capacitor with a dielectric of flowing cooling liquid, which maintains a constant temperature and relative permittivity, stabilizing plasma generation and suppressing electrostatic capacity fluctuations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a high frequency current is applied to an antenna to generate plasma, then plasma generation is achieved, but the antenna conductor temperature increases causing damage and unstable plasma generation
Solution Approach 1:
A cooling liquid is introduced as an intermediary substance between the antenna conductor and the surrounding environment. The cooling liquid flows through the antenna conductor's internal passage, absorbing heat from the high frequency current and preventing excessive temperature rise, thereby protecting the antenna conductor and stabilizing plasma generation.
Solution Approach 2:
The invention utilizes hydraulic cooling by circulating a cooling liquid through the antenna conductor. This hydraulic system efficiently removes heat generated during plasma generation, preventing thermal damage to the antenna conductor and maintaining stable operating conditions.
2Ease of operation
If floating capacitors or intermediate capacitors with variable capacity are used to control electrostatic coupling, then electrostatic coupling control is improved, but the relative permittivity varies due to heat causing unexpected electrostatic capacity fluctuations
Solution Approach 1:
The cooling liquid serves as a thermal intermediary for the capacitor, absorbing heat and maintaining a stable temperature environment. This prevents heat-induced variations in the relative permittivity of the capacitor dielectric, thereby stabilizing the electrostatic capacity while allowing operational control of electrostatic coupling.
Solution Approach 2:
By actively managing the temperature parameter of the capacitor through cooling liquid circulation, the invention prevents unintended changes in the relative permittivity parameter. This ensures that electrostatic capacity remains stable and predictable, allowing precise control of electrostatic coupling without unexpected fluctuations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration allows for stable plasma generation and suppression of unexpected electrostatic capacity fluctuations, reducing the risk of antenna damage and improving the stability of the plasma processing device.
Implementation Method 1
the antenna conductor has therein a flow path in which a cooling liquid flows
Implementation Method 2
the antenna conductor can be cooled by the cooling liquid
Implementation Method 3
a dielectric of the variable capacitor is constituted of the cooling liquid flowing through the antenna conductor
Implementation Method 4
the relative permittivity of the floating capacitor or the intermediate capacitor is varied due to heat generated during plasma generation
Implementation Method 5
a high frequency current is applied to an antenna to generate an induced electric field, an inductively coupled plasma (abbreviated as ICP) is generated by the induced electric field
Data Source
AI summary
An antenna conductor is cooled to stably generate plasma, and unexpected fluctuation in the electrostatic capacity of a variable capacitor connected to the antenna conductor is suppressed while cooling the variable capacitor. A plasma processing device which generates plasma in a vacuum container and processes a substrate by using the plasma is provided. The plasma processing device includes: an antenna conductor through which a high-frequency current is caused to flow to generate plasma, and a variable capacitor which is electrically connected to the antenna conductor. The antenna conductor has a flow path in which a cooling liquid flows. A dielectric of the variable capacitor is constituted of the cooling liquid flowing through the antenna conductor.