Antenna Position Control for Plasma Ignition Stability
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Solution Overview
Problem
Existing substrate processing methods face challenges in achieving stable plasma ignition and uniform film formation due to inadequate control over the position of the antenna during plasma generation, leading to inefficiencies in processing multiple substrates simultaneously.
Innovation Solution
A substrate processing method that includes a substrate processing apparatus with a vacuum container, a rotary table, a plasma generator with a movable antenna, and a driving unit to adjust the antenna's position based on stored ignition condition information, ensuring optimal plasma ignition conditions for each process step.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the antenna position is not controlled during plasma generation, then the device complexity is reduced, but the plasma ignition stability deteriorates
Solution Approach 1:
The system pre-stores optimal antenna position information corresponding to various process conditions in a storage unit. Before plasma generation begins, the control unit determines the appropriate antenna position by referring to this pre-stored information based on the set process conditions, eliminating the need for real-time position optimization during plasma generation.
Solution Approach 2:
The patent replaces complex real-time mechanical adjustment systems with an information-based control system. The control unit uses stored position information and process condition data to determine optimal antenna positions, substituting mechanical trial-and-adjustment mechanisms with a computational lookup approach.
2Manufacturing precision
If the antenna position is adjusted for optimal plasma ignition, then the film formation uniformity is improved, but the device complexity increases
Solution Approach 1:
The antenna system is designed to be movable rather than fixed, allowing dynamic adjustment of the antenna position relative to the rotary table. The first driving unit enables the antenna to be positioned at different locations corresponding to different process conditions, optimizing plasma ignition and film formation uniformity for each condition.
Solution Approach 2:
The system changes the spatial parameter of antenna position based on different process conditions. By storing and retrieving optimal position information corresponding to various process parameters, the system adapts the antenna position to match the specific requirements of each film formation process, thereby improving uniformity.
3Manufacturing precision
If the antenna position is optimized for each process condition, then the processing quality is improved, but the operation time increases
Solution Approach 1:
Optimal antenna position information for various process conditions is pre-calculated and stored in the storage unit before actual processing begins. When a process condition is set, the control unit quickly retrieves the corresponding position information from storage, avoiding time-consuming real-time optimization during each processing cycle.
Solution Approach 2:
The system uses stored position information as a copy of optimal settings rather than recalculating or re-optimizing positions during each process. This informational copy allows rapid retrieval and implementation of optimal antenna positions without repeating the optimization process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables stable plasma ignition and enhances in-plane uniformity of film formation, improving process performance and extending equipment lifespan by optimizing the antenna's position during plasma generation.
Implementation Method 1
a plasma generator that includes an antenna and generates a plasma in the vacuum container
Data Source
AI summary
A substrate processing method includes providing a substrate processing apparatus including a vacuum container, a rotary table that includes a placement surface on which a plurality of substrates is disposed, and rotates the plurality of substrates, a plasma generator that includes an antenna and generates a plasma in the vacuum container, and a first driving unit that moves the antenna; storing ignition condition information that associate a process condition and a position of the antenna with each other, in a storage; determining the position of the antenna corresponding to the process condition of the ignition condition information that matches a process condition set in a recipe by referring to the storage; and moving the antenna to the determined position of the antenna using the first driving unit, thereby processing the plurality of the substrates.