Anti-blazed DMD Phase Shift for Lithography Resolution

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Solution Overview

Problem

Current spatial light modulators, such as digital micromirror devices (DMDs), face limitations in achieving improved resolution and depth of focus, especially as device dimensions shrink, and are constrained by the topology of substrates in digital lithography applications.

Innovation Solution

Implementing a spatial light modulator with a 180-degree phase shift between adjacent pixels, allowing for pixel blending by forming partially overlapping images, which enhances resolution and depth of focus through precise control of micromirror angles and positions.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a blazed DMD with 0-degree phase shift between adjacent micromirrors is used, then good resolution and depth of focus are achieved, but improved resolution and depth of focus are needed as device dimensions become smaller

Engineering Contradiction:
Improveline spacing resolutionVSAvoidapplicability to smaller device dimensions
Core Design Contradiction:
Manufacturing precisionVSAdaptability or versatility

Solution Approach 1:

The patent changes the phase shift parameter from 0 degrees (blazed DMD) to 180 degrees (anti-blazed DMD). This parameter change enables improved resolution and depth of focus for smaller device dimensions while maintaining effectiveness in digital lithography applications, directly resolving the limitation of conventional blazed DMDs

Inventive Principle:
Principle #35Parameter changes

2Manufacturing precision

If hard phase shift masks are used to print very narrow and dark lines, then narrow line printing is achieved, but the method is limited by the topology of the substrate

Engineering Contradiction:
Improvenarrow line printing capabilityVSAvoidsubstrate topology flexibility
Core Design Contradiction:
Manufacturing precisionVSAdaptability or versatility

Solution Approach 1:

The patent replaces the mechanical hard phase shift mask system with an anti-blazed DMD system that uses controlled micromirror tilting and phase shifting. This substitution eliminates the substrate topology limitations inherent in physical masks, allowing narrow line printing on various substrate configurations without being constrained by mask geometry

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Illumination intensity

If micromirrors are positioned at extreme angles for maximum brightness control, then light intensity modulation is achieved, but intermediate brightness levels require positioning between extreme positions reducing control precision

Engineering Contradiction:
Improvelight brightness controlVSAvoidmicromirror positioning precision
Core Design Contradiction:
Illumination intensityVSManufacturing precision

Solution Approach 1:

The patent introduces phase shift as an intermediary mechanism between micromirror position and light intensity. By combining phase modulation with positional control, the system achieves precise intermediate brightness levels without requiring extremely precise micromirror positioning, as the phase shift compensates for positioning variations and enables accurate intensity control

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration results in improved resolution, depth of focus, and pixel blending capabilities, enabling tighter feature spacing and smoother printed features without topological limitations, effectively addressing the limitations of conventional blazed DMDs.

Implementation Method 1

The spatial light modulator is configured such that there is a 180-degree phase shift between adjacent spatial light modulator pixels

Methodology Applied
Scientific EffectPhase shift: Phase Modulation

Implementation Method 2

Each micromirror corresponds to a single pixel of the image to be displayed and can be tilted at various angles about a hinge. In the on state, light is reflected from the DMD into a lens and ultimately a pixel is brightly projected onto a screen

Methodology Applied
Scientific EffectLight reflection: Reflection

Data Source

PatentUS10983441B2Resolution enhanced digital lithography with anti-blazed DMD
Publication Date: 2021.04.20 APPLIED MATERIALS INC
  • US10983441B2 patent drawing
  • US10983441B2 patent drawing
  • US10983441B2 patent drawing

AI summary

Embodiments of the present disclosure generally relate to methods and apparatus for processing one or more substrates, and more specifically to improved spatial light modulators for digital lithography systems and digital lithography methods using improved spatial light modulators. The spatial light modulator is configured such that there is a 180-degree phase shift between adjacent spatial light modulator pixels. The spatial light modulator is useful for pixel blending by forming a plurality of partially overlapping images, at least one of the plurality of partially overlapping images having at least two pixels formed by a first pair of adjacent spatial light modulator pixels having a 180-degree phase shift therebetween. The spatial light modulator results in improved resolution, depth of focus, and pixel blending.