Anti-reflection Coating Composition for Photolithography
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current bottom anti-reflection coating (BARC) layers in photolithography have a low extinction coefficient, leading to thick layers that are difficult to remove, result in prolonged etching times, and cause excessive loss of the photoresist layer, and suffer from poor storage stability and high defect rates due to acid catalyst residues.
Innovation Solution
An anti-reflection coating composition comprising a matting resin with a weight average molecular weight of less than 20,000, a catalyst, and a crosslinking agent, where the matting resin is prepared from a matrix resin and a chromophoric compound, enhancing light absorption and etching performance, and using an organic acid salt as a catalyst to improve storage stability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the BARC layer thickness is increased to improve light absorption, then the extinction coefficient effect is enhanced, but the etching time is prolonged and photoresist loss increases
Solution Approach 1:
The patent changes the chemical composition parameters of the BARC layer by incorporating specific resins (novolac resin, phenolic resin), crosslinking agents (glycoluril-aldehyde resin, melamine-aldehyde resin), and catalysts (organic acid salts). These compositional parameter changes enable the coating to achieve sufficient light absorption with a thinner layer thickness, thereby reducing etching time while maintaining anti-reflection effectiveness.
Solution Approach 2:
The patent employs a composite material system combining multiple resins, crosslinking agents, and catalysts in specific ratios. This composite formulation creates a BARC layer with optimized optical and etching properties, allowing the layer to be thinner while still providing adequate light absorption and manageable etching characteristics.
2Strength
If conventional acid catalysts are used to achieve crosslinking, then crosslinking performance is achieved, but storage stability decreases and defect rates increase due to residues
Solution Approach 1:
The patent replaces conventional acid catalysts with organic acid salts that decompose completely during the crosslinking process, leaving no harmful residues. The organic acid salts (such as p-toluenesulfonate, dodecylbenzene sulfonate, oxalate, phthalate, or naphthalene sulfonate) serve as temporary catalysts that are consumed in the reaction, eliminating the storage stability and defect issues associated with persistent acid catalysts.
Solution Approach 2:
The patent changes the catalyst type from conventional acids to organic acid salts with specific molecular structures and properties. This parameter change in catalyst chemistry enables complete decomposition without residues, improving storage stability while maintaining crosslinking performance.
3Productivity
If the BARC layer is made thinner to reduce etching time, then etching efficiency improves, but light absorption effectiveness decreases
Solution Approach 1:
The patent uses a composite material system with specific resin combinations (novolac resin, phenolic resin), crosslinking agents, and organic acid salts that enhance the optical properties of the BARC layer. This composite formulation increases the extinction coefficient, allowing thinner layers to maintain adequate light absorption while enabling faster etching.
Solution Approach 2:
The patent optimizes the thickness parameter of the BARC layer to a specific range (5-20 nm) and combines it with compositional parameter changes in the coating formulation. This coordinated parameter optimization enables the thin layer to achieve both sufficient light absorption and rapid etching.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves a higher extinction coefficient, allowing for thinner BARC layers with shorter etching times, reduced photoresist loss, and improved storage stability, enabling high-resolution photoresist patterns and precise pattern transfer.
Implementation Method 1
a raw material for preparing the matting resin A includes a matrix resin and a chromophoric compound
Implementation Method 2
the active component includes a matting resin A, a catalyst C, and a crosslinking agent D
Data Source
AI summary
Provided is an anti-reflection coating composition. The anti-reflection coating composition includes an active component and a solvent B. The active component includes a matting resin A, a catalyst C, and a crosslinking agent D. The weight average molecular weight of the matting resin A is less than or equal to 20000. Also provided is use of the anti-reflection coating composition.