Anti-Reflection Layer Structure to Suppress Surface Wrinkles
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing anti-reflection structures suffer from wrinkle generation on the surface, which deteriorates anti-reflection performance and transparency, particularly in camera modules and information terminal devices.
Innovation Solution
An anti-reflection structure comprising an adhesion layer with a storage elastic modulus of 25 MPa or greater and fine uneven structures on both sides, with uneven periods less than the wavelength of visible light, is developed to suppress wrinkle formation and maintain high anti-reflection performance and transparency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a thin film with fine uneven structure (moth-eye structure) is formed on the light incident surface to reduce reflectance, then anti-reflection performance is improved, but wrinkles are generated on the surface which deteriorate appearance and adversely affect anti-reflection performance and transparency
Solution Approach 1:
The patent changes the material parameters of the adhesion layer, specifically setting the storage elastic modulus to 25 MPa or more, to suppress wrinkle generation while maintaining anti-reflection performance. This parameter optimization resolves the contradiction by preventing the harmful wrinkle formation that would otherwise occur during transfer molding of the fine uneven structure
Solution Approach 2:
The patent employs a composite structure consisting of an adhesion layer with specific elastic modulus properties and an anti-reflection layer with fine uneven structures. This composite material approach allows the adhesion layer to provide mechanical support preventing wrinkles while the anti-reflection layer maintains its optical functionality
2Manufacturing precision
If the internal stress of the formed anti-reflection layer is kept high during transfer molding, then manufacturing precision is improved, but wrinkle generation on the surface increases
Solution Approach 1:
The patent optimizes the storage elastic modulus of the adhesion layer to 25 MPa or more, which allows the structure to withstand the internal stress generated during transfer molding of the fine uneven structure without developing wrinkles. This parameter change enables high manufacturing precision while preventing the harmful wrinkle formation
3Reliability
If the uneven period of fine uneven structures is set to be equal to or less than the wavelength of visible light, then anti-reflection performance is improved, but manufacturing difficulty increases
Solution Approach 1:
The patent sets the uneven period to specific values (equal to or less than the wavelength of visible light) to optimize anti-reflection performance. By establishing this specific parameter range, the patent achieves excellent optical performance while providing clear manufacturing guidelines for fabricating the fine uneven structures
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed structure effectively reduces wrinkle generation, enhancing anti-reflection performance and transparency, resulting in improved image quality and visibility in camera modules and information terminal devices.
Implementation Method 1
a storage elastic modulus of the adhesion layer is equal to or greater than 25 MPa (MegaPascal)
Implementation Method 2
the fine uneven structures formed on both sides of the anti-reflection layer each have an uneven period equal to or less than the wavelength of visible light
Data Source
AI summary
Provided is an anti-reflection structure with excellent anti-reflection performance and transparency, and with reduced generation of wrinkles on the surface. The present disclosure is an anti-reflection structure 10 including at least an adhesion layer 20 and an anti-reflection layer 30 formed on the adhesion layer 20 and having fine uneven structures on both sides thereof. The storage elastic modulus E′ of the adhesion layer 20 is equal to or greater than 25 MPa, and fine uneven structures formed on both sides of the anti-reflection layer 30 each have an uneven period P equal to or less than the wavelength of visible light.