Antifuse With Comb-Like Top Electrode for Low-Voltage Programming

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Solution Overview

Problem

Existing antifuse structures in the semiconductor industry require high voltage for programming, which can be power-intensive and inefficient.

Innovation Solution

The method involves forming a semiconductor structure with a bottom electrode, an antifuse dielectric layer, and a top electrode with projections extending towards the bottom electrode, creating high aspect ratio channels that concentrate the electrical field for low-power programming by filling the recess and channels with conductive material, allowing for efficient dielectric breakdown.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If high voltage is applied for programming antifuse structures, then dielectric breakdown is achieved, but power consumption increases

Engineering Contradiction:
Improveprogramming reliabilityVSAvoidpower consumption
Core Design Contradiction:
ReliabilityVSUse of energy by moving object

Solution Approach 1:

The top electrode is segmented into multiple protrusions that extend into the antifuse dielectric layer, creating multiple localized high-field regions. This segmentation allows the programming voltage to be distributed across multiple breakdown points, achieving reliable programming at lower overall voltage levels and reducing power consumption.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The protrusions of the top electrode create localized regions of high electric field concentration at their tips, where dielectric breakdown is initiated. This local quality enhancement allows breakdown to occur at specific critical points first, enabling programming at lower voltages while maintaining reliability through the distributed nature of multiple protrusions.

Inventive Principle:
Principle #3Local quality

2Ease of manufacture

If conventional antifuse structures are used, then manufacturing is simple, but programming requires high voltage

Engineering Contradiction:
Improvestructure fabricationVSAvoidprogramming voltage
Core Design Contradiction:
Ease of manufactureVSPower

Solution Approach 1:

The top electrode is formed with multiple protrusions using standard semiconductor fabrication techniques such as deposition and etching. This segmented structure is manufactured using conventional processes, maintaining ease of manufacture while enabling lower programming voltage through the distributed field concentration effect of multiple protrusion tips.

Inventive Principle:
Principle #1Segmentation

3Reliability

If high voltage programming is used, then dielectric breakdown occurs, but programming efficiency decreases

Engineering Contradiction:
Improvebreakdown reliabilityVSAvoidprogramming efficiency
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The protrusions create localized high-field regions that concentrate the electric field at their tips, initiating dielectric breakdown at lower overall voltage levels. This local field enhancement improves programming efficiency by reducing the time and energy required for breakdown while maintaining reliability through the distributed breakdown mechanism across multiple protrusions.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables programming of semiconductor devices using relatively low power by magnifying the electrical field at the channel bottoms, facilitating dielectric breakdown and establishing a conductive pathway without the need for high voltage, thus improving programming efficiency.

Implementation Method 1

magnifying the electrical field at the channel bottoms, facilitating dielectric breakdown

Methodology Applied
Scientific EffectElectrical field concentration: Electric Field

Implementation Method 2

facilitating dielectric breakdown and establishing a conductive pathway

Methodology Applied
Scientific EffectDielectric breakdown:

Data Source

PatentUS9997453B2Antifuse having comb-like top electrode
Publication Date: 2018.06.12 INTERNATIONAL BUSINESS MACHINE CORPORATION
  • US9997453B2 patent drawing
  • US9997453B2 patent drawing
  • US9997453B2 patent drawing

AI summary

Antifuse structures are provided for use in applications such as field programmable gate arrays and programmable read-only memories. High aspect ratio channels within an antifuse dielectric layer are used to form antifuse electrode projections. The projections are configured to enhance the electric field across the antifuse structures, thereby facilitating dielectric breakdown. The antifuse structures can enable low-voltage programming.