Anti-Fuse Notch Structure for Predictable Rupture Point

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Solution Overview

Problem

Existing anti-fuse structures lack predictability in their rupture point, making it difficult to consistently program one-time programmable non-volatile memory devices.

Innovation Solution

The anti-fuse structure incorporates a substrate with shallow trench isolation, a notch, an electrode structure filling the notch, and a doped region, allowing for a predictable rupture point by concentrating electrical fields at the notch or bird's beak during programming, enabling precise programming of the anti-fuse structure.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a conventional anti-fuse structure is used, then the programming function is achieved, but the rupture point is unpredictable

Engineering Contradiction:
Improverupture point predictabilityVSAvoidstructure complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent introduces a notch structure at a specific location in the gate dielectric layer to create a localized weak point. This notch has different geometric properties (sharp corner, reduced thickness) compared to the rest of the dielectric layer, causing electrical field concentration specifically at this location. This local structural modification ensures that breakdown occurs predictably at the notch rather than at random locations, solving the rupture point predictability problem without fundamentally changing the overall anti-fuse structure.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The notch is pre-formed in the gate dielectric layer during the manufacturing process, before the actual programming operation. This preliminary structural preparation creates a predetermined breakdown path that will activate when programming voltage is applied. By preparing the weak point in advance through the notch formation, the patent ensures that the rupture occurs at the expected location during programming, eliminating the need for post-manufacturing adjustment or repair.

Inventive Principle:
Principle #10Preliminary action

2Reliability

If the rupture point is unpredictable, then programming can be performed, but programming reliability deteriorates

Engineering Contradiction:
Improveprogramming reliabilityVSAvoidrupture point control
Core Design Contradiction:
ReliabilityVSManufacturing precision

Solution Approach 1:

By creating a localized notch structure with distinct geometric characteristics (sharp corners, reduced thickness) at a specific position in the gate dielectric, the patent concentrates the electrical field at this precise location during programming. This local structural differentiation ensures that breakdown occurs reliably at the notch rather than at unpredictable random locations, thereby improving programming reliability through controlled rupture point formation.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The notch structure provides a built-in feedback mechanism by creating a preferred breakdown path that can be verified during manufacturing. The consistent formation of the notch ensures that subsequent programming operations will produce predictable results, allowing for process control and quality assurance. The structured weak point acts as a feedback element that guides the breakdown process to the intended location.

Inventive Principle:
Principle #23Feedback

3Manufacturing precision

If a predictable rupture point is implemented, then programming precision is improved, but the manufacturing process becomes more complex

Engineering Contradiction:
Improverupture point precisionVSAvoidmanufacturing process simplicity
Core Design Contradiction:
Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The patent introduces a localized notch structure at a specific position in the gate dielectric layer, creating a controlled weak point with distinct geometric properties. This local modification concentrates the electrical field during programming, ensuring predictable breakdown at the notch location. The approach achieves precise rupture point control through a focused structural change rather than complex overall redesign.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The notch is formed during the manufacturing process as a preliminary step before programming, creating a predetermined breakdown path in advance. This upfront preparation ensures that when programming voltage is applied, the breakdown occurs at the pre-specified location with high precision. The preliminary formation of the weak point integrates the precision requirement into the manufacturing flow itself.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This design ensures a predictable rupture point at the notch or bird's beak, simplifying the manufacturing process and improving the reliability of anti-fuse programming in non-volatile memory devices.

Implementation Method 1

allowing for a predictable rupture point by concentrating electrical fields at the notch or bird's beak during programming

Methodology Applied
Scientific EffectElectrical field concentration: Electric Field

Implementation Method 2

an anti-fuse structure consist of a transistor is programmed when the gate dielectric breakdown occurs

Methodology Applied
Scientific EffectDielectric breakdown: Avalanche Breakdown

Data Source

PatentUS8772907B1Anti-fuse structure and anti-fuse programming method
Publication Date: 2014.07.08 UNITED MICROELECTRONICS CORP
  • US8772907B1 patent drawing
  • US8772907B1 patent drawing
  • US8772907B1 patent drawing

AI summary

An anti-fuse structure includes a substrate having at least a shallow trench isolation formed therein, a notch formed between the substrate and the STI, an electrode structure formed on the substrate, the electrode structure filling the notch, and a doped region formed in the substrate on a side of the electrode structure opposite to the notch.