Anti-glare Substrate Textured Surface with Multi-Elevation Features

The patent replaces mechanical texturing methods (sandblasting, liquid etching) with a photolithography-based etching process. A photomask with precisely defined surface feature patterns is used to control the etching process, substituting random mechanical action with controlled photochemical etching. This allows precise and repeatable surface geometry while maintaining the diffuse reflection effect.

The patent applies local quality by creating specific surface feature geometries with controlled dimensions, spacing, and depth. Instead of uniform surface roughness, the design uses locally optimized features (such as microlenses, prisms, or specific pattern geometries) that provide diffuse reflection in specific directions while maintaining optical clarity. The surface features are strategically positioned and dimensioned to achieve low specular reflection without excessive transmission haze or pixel power deviation.

The patent employs asymmetric and aperiodic surface feature patterns that avoid regular periodicity. By using non-repeating patterns with varied feature sizes, shapes, and spacings, the design prevents the formation of Moiré interference fringes and reflection color artifacts. The asymmetric distribution of surface features ensures that reflected light does not constructively interfere in specific directions, eliminating the harmful optical effects associated with periodic structures.