Antireflective Coating Crosslinker Sublimation Control

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Solution Overview

Problem

Current antireflective coating compositions used in photoresist processes face limitations in achieving high resolution images due to reflection and scattering of radiation from the substrate/photoresist interface, leading to non-uniform linewidths and resolution issues in semiconductor manufacturing.

Innovation Solution

Development of new antireflective compositions with a crosslinker component resistant to sublimation, incorporating high molecular weight nitrogen-containing crosslinkers and chromophore groups that absorb exposure radiation, along with a resin component and acid generator compounds, to enhance lithographic performance and image resolution.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If conventional antireflective coating compositions are used, then radiation absorption is achieved, but crosslinker sublimation occurs during thermal treatment causing image resolution degradation and linewidth non-uniformity

Engineering Contradiction:

Improveimage resolutionVSAvoidcrosslinker sublimation

Core Design Contradiction:

Manufacturing precisionVSLoss of substance

Solution Approach 1:

The patent changes the molecular weight parameter of the crosslinker from conventional low molecular weight to high molecular weight (greater than 300 Daltons, preferably greater than 500 Daltons). This parameter change reduces the vapor pressure and sublimation tendency of the crosslinker during thermal treatment, thereby preventing crosslinker loss and maintaining image resolution and linewidth uniformity.

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent creates a composite antireflective coating composition that integrates multiple functional components: high molecular weight crosslinkers (such as glycoluril, melamine, or benzoguanamine derivatives), resin components with chromophore groups for radiation absorption, and acid generator compounds. This composite structure achieves both effective radiation absorption and resistance to crosslinker sublimation.

Inventive Principle:

Principle #40Composite materials

2Stability of the object's composition

If high molecular weight crosslinkers are used to prevent sublimation, then crosslinker stability is improved, but coating composition complexity increases

Engineering Contradiction:

Improvecrosslinker stabilityVSAvoidcoating composition complexity

Core Design Contradiction:

Stability of the object's compositionVSDevice complexity

Solution Approach 1:

The patent specifies particular parameter ranges for the high molecular weight crosslinkers (molecular weight greater than 300 Daltons, preferably greater than 500 Daltons) and defines specific chemical structures (glycoluril, melamine, benzoguanamine derivatives with particular substituent patterns). These defined parameters provide guidance for formulation while ensuring stability, balancing complexity with performance.

Inventive Principle:

Principle #35Parameter changes

3Object-affected harmful factors

If radiation absorbing chromophore groups are incorporated into the resin component, then radiation absorption is enhanced, but manufacturing complexity increases

Engineering Contradiction:

Improveradiation reflectionVSAvoidmanufacturing complexity

Core Design Contradiction:

Object-affected harmful factorsVSEase of manufacture

Solution Approach 1:

The patent specifies particular parameter ranges and structural features for the chromophore-containing resin components, including molecular weight ranges and specific chromophore group types (such as aromatic hydrocarbon groups). These defined parameters enable manufacturers to select from a range of suitable commercial resins, simplifying the manufacturing process while ensuring effective radiation absorption.

Inventive Principle:

Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The proposed antireflective compositions improve image resolution and uniformity by minimizing sublimation of crosslinker components and effectively absorbing radiation, resulting in enhanced lithographic results and reduced linewidth variations.

Implementation Method 1

chromophore groups that absorb exposure radiation

Methodology Applied

Scientific EffectAbsorption (EM radiation): Absorption (EM radiation)

Implementation Method 2

crosslinker component that is resistant to sublimination from the composition coating layer during lithographic processing

Methodology Applied

Scientific EffectSublimation: Sublimation

Data Source

PatentUS8142988B2Coating compositions for use with an overcoated photoresist

Publication Date: 2012.03.27 DUPONT ELECTRONIC MATERIALS INT LLC

AI summary

Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred compositions of the invention comprise contain a crosslinker component that is resistant to sublimination or other migration crosslinker from the composition coating layer during lithographic processing.