Antireflective Coating Compositions for Photoresist Development
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Solution Overview
Problem
Current organic antireflective coating compositions for photoresists in semiconductor manufacturing are limited by reflection and scattering of radiation, leading to non-uniform photoresist linewidth and resolution issues, and require additional processing steps for removal, such as plasma etching.
Innovation Solution
Development of new antireflective coating compositions containing tetrapolymers with distinct functional groups that can be dissolved by an aqueous alkaline developer, incorporating chromophore groups for radiation absorption and photoacid-labile groups for enhanced solubility, allowing for single-step removal with the photoresist developer.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If current organic antireflective coating compositions are used, then radiation reflection is reduced, but additional processing steps (plasma etching) are required for removal
Solution Approach 1:
The patent combines the antireflective coating layer with the photoresist layer by making the coating composition compatible with the photoresist developer. The coating composition includes specific components (chromophore groups, photoacid-labile groups, and soluble polymer matrices) that allow simultaneous removal of both the photoresist and antireflective coating in a single development step, eliminating the need for separate plasma etching processes.
Solution Approach 2:
The antireflective coating composition is designed to serve multiple functions: it provides radiation absorption during exposure, acts as a compatible layer during photoresist development, and enables single-step removal with the photoresist developer. The coating includes chromophore groups for radiation absorption and photoacid-labile groups that trigger selective dissolution during development.
2Object-affected harmful factors
If radiation absorbing layer is interposed between substrate and photoresist, then reflected radiation is absorbed, but manufacturing complexity increases
Solution Approach 1:
The patent merges the radiation-absorbing antireflective coating with the photoresist layer by formulating the coating composition to be compatible with the photoresist developer. This integration allows both layers to be applied and processed together, simplifying manufacturing while maintaining the radiation absorption function through incorporated chromophore groups.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The new compositions effectively reduce radiation reflection, improve photoresist linewidth uniformity, and eliminate the need for plasma etching, simplifying the manufacturing process and reducing costs by enabling single-step removal with the photoresist developer.
Implementation Method 1
incorporating chromophore groups for radiation absorption
Implementation Method 2
photoacid-labile groups for enhanced solubility
Implementation Method 3
can be dissolved by an aqueous alkaline developer
Data Source
AI summary
Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development of an overcoated photoresist layer. Preferred coating compositions comprise a tetrapolymer that comprises at least four distinct functional groups.